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1.
报道了InAs/GaAs量子点激光器GSMBE生长,激光器器件有源区包含了层叠的5层InAs量子点微结构.AFM显微图像显示相同生长条件下的未覆盖表层量子点样品呈现出不均匀的多模尺寸分布.制作了脊条宽为6 μm,腔长为1.5 min的未镀膜激光器器件,器件室温连续工作的最大输出功率达到51.1 mW (单面),最高工作温度70℃.激光光谱包含一系列非均匀的多纵模簇,且随着电流的增加,纵模簇个数也增加.经分析认为,光谱的这一不同于常规半导体激光器的性质是由量子点的非均匀性以及量子点之间互不关联性导致的,是多个互相无关联的不同特性激光的集体行为.  相似文献   

2.
利用分子束外延技术在GaAs(100)衬底上生长了1.3μm InAs DWELL量子点激光器结构,研究了有源区Be掺杂对量子点激光器性能的影响。研究表明,对有源区进行Be掺杂可以有效降低InAs量子点激光器的阈值电流密度,提升激光器的输出功率,增加激光器的温度稳定性。研制的Be掺杂InAs量子点激光器的阈值电流降低到12mA,相应的阈值电流密度仅为100 A/cm2,激光器的最高输出功率达到183 mW,最高工作温度达到了130℃。这对InAs量子点激光器器件在光通信系统中的应用具有重要意义。  相似文献   

3.
利用气源分子束外延(GSMBE)技术,在InP(100)衬底上生长InAs量子点激光器.有源区包含5层InAs量子点,每层量子点的平均尺寸是2.9 nm和76 nm,面密度在1010 cm-2左右,势垒层为InGaAsP.室温下量子点的光致发光中心波长在1.55 μm,发光峰半高宽为108 imeV.通过化学湿法腐蚀制备双沟道8μm宽脊条激光器,在20℃连续波工作模式下,腔长为0.7 mm的激光器的阈值电流为143 mA(2.5 kA/cm2),器件的激射中心波长在1.55 μm.由于量子点尺寸的非均匀性,在大电流注入,激光器的激射谱展宽.器件单端面最大输出功率为27 mW,功率斜率效率为130 mW/A.  相似文献   

4.
系统介绍了利用分子束外延方法在纯GaAs材料上生长InAs/GaAs耦合量子点结构。讨论了生长温度和上下两层量子点中InAs的淀积量对于材料发光性质和表面形貌的影响。通过优化生长参数,得到了室温发光波长在1.436μm,FWHM为27meV的耦合量子点材料。第二层量子点的密度在9109到1.41010cm-2之间。耦合量子点结构为拓展GaAs基材料在量子功能器件应用中的发光波长提供了新的途径。  相似文献   

5.
成功制备出2.6μm GaSb基I型InGaAsSb/AlGaAsSb量子阱高功率半导体激光器.利用分子束外延设备(MBE)生长出器件的材料结构.为了得到更好的光学质量, 将量子阱的生长温度优化至500℃, 并将量子阱的压应变调节为1.3%.制备了脊宽100 μm 、腔长1.5 mm的激光单管器件.在未镀膜下该激光器实现了最大328 mW室温连续工作, 阈值电流密度为402 A/cm2, 在脉冲工作模式下, 功率达到700 mW.  相似文献   

6.
对利用气源分子束外延(GSMBE)技术生长的InAs/GaAs量子点激光器的工作结温进行了研究,结温的测试是基于量子点激光器的温度升高会导致Fabry-Perot(F-P)腔的腔模移动.在20℃脉冲工作模式下,当脉冲注入电流的占空比从1%变化到准连续波(95%),InAs/GaAS量子点激光器的结温升高了23.9℃,在相同的测试条件下,商用量子阱激光器的结温仅升高了3.5℃.InAs/GaAs量子点激光器的结温比商用量子阱激光器的结温升高了6.8倍,这是影响激光器性能的一个重要参数.  相似文献   

7.
InAs/InP量子点激光器中欧姆接触合金层特性研究   总被引:3,自引:3,他引:0  
合金层与InAs/InP量子点激光器的接触电阻对激光 器的性能有很大影响,而接触电阻的 大小与合金材料、退火温度和退火时间有关。本文采用Au/Ni/Au/Ge做InAs/InP量子点激光 器的欧姆接触合金层,通过改变退 火温度和退火时间调节量子点激光器中接触电阻的阻值。实验发现,退火时间对接触电阻的 改变不 大,但是提高退火温度却能极大地降低接触电阻的阻值。实验获得了Au/Ni/Au/Ge 合金层与InAs/InP量子点激光器最佳欧姆接触条件,通过矩阵传输法测得相应接触电阻率为 1.34×10-6 Ω·cm2。在此条件下,制备激射中心波长为 1.577μm的多模量子点 激光器,室温下单面最大输出功率达到和超过39mW。  相似文献   

8.
成功制备出2.6μmGaSb基I型InGaAsSb/AlGaAsSb量子阱高功率半导体激光器.利用分子束外延设备(MBE)生长出器件的材料结构.为了得到更好的光学质量,将量子阱的生长温度优化至500℃,并将量子阱的压应变调节为1.3%.制备了脊宽100μm、腔长1.5mm的激光单管器件.在未镀膜下该激光器实现了最大328mW室温连续工作,阈值电流密度为402A/cm~2,在脉冲工作模式下,功率达到700mW.  相似文献   

9.
日本富士通研究所首次在1.3μm波段实现量子点半导体激光器室温连续振荡.采用分子束外延(MBE),点的大小以相当于在1.25μm波段的生长速度自身形成量子点,并在这个生长速度下提高量子点的密度.在此基础上,把InAs量子点用In-GaAs覆盖,减缓量子点产生畸变,使其达到与1.3μm波段相对应尺寸,重复3次生长获  相似文献   

10.
高国龙 《红外》2005,(6):47-47
美国喷气推进实验室最近研究出了一种用于生长高质量InAs量子点的改进型方法。用这种改进型方法制作的InAs/InGaAs/InP量子点半导体激光器,能够在室温下在≥1.8μm波长上工作。而以前报道的基于InP衬底的InAs量子点激光器却只能在77K的低温下在1.9μm波长上工作。  相似文献   

11.
This paper presents a brief overview of the Applied Centura(R)DPS(R)system,configured with silicon etch DPS Ⅱ chamber, with emphasis on discussing tuning capability for CD uniformity control. It also presents the studies of etch process chemistry and film integration impact for an overall successful gate patterning development. Discussions will focus on resolutions to key issues, such as CD uniformity, line-edge roughness, and multilayer film etching integration.  相似文献   

12.
We have fabricated the white organic light-emitting devices (WOLEDs) based on 4,4' -bis(2,2 -diphenyl vinyl)-1,1' - biphenyl (DPVBi) and phosphorescence sensitized 5,6,11,12,-tetraphenylnaphthacene (rubrene). The device structure is ITO/2T-NATA (20 nm)/NPBX (20 nm)/CBP: x%Ir(ppy)3:0.5% rubrene (8 nm)/NPBX (5 nm)/DPVBi (30 nm)/Alq(30 nm)/LiF(0.5 nm)/A1. In the devices, DPVBi acts as a blue light-emitting layer, the rubrene is sensitized by a phosphorescent material, fac tris (2-phenylpyridine) iridium [Ir(ppy)3], acts as a yellow light-emitting layer, and N,N' -bis- (1-naphthyl)- N,N' -diphenyl -1, 1' -biphenyl-4,4' -diamine (NPBX) acts as a hole transporting and exciton blocker layer, respectively. When the concentration of Ir (PPY)3 is 6wt%, the maximum luminance is 24960 cd/m^2 at an applied voltage of 15 V, and the maximum luminous efficiency is 5.17 cd/A at an applied voltage of 8 V.  相似文献   

13.
To meet the need of automatic image features extraction with high precision in visual inspection, a complete approach to automatic identification and sub-pixel center location for similar-ellipse feature is proposed. In the method, the feature area is identified automatically based on the edge attribute, and the sub-pixel center location is accomplished with the leastsquare algorithm. It shows that the method is valid, practical, and has high precision by experiment. Meanwhile this method can meet the need of instrumentation of visual inspection because of easy realization and without man-machine interaction.  相似文献   

14.
本论文提出一种在多天线MIMO信道相关性建模中小角度扩展近似理论算法,并应用于分析MIMO系统性能。分析中分别对三种不同角能量分布情况下的空间相关性研发快速近似计算法,并同时提出双模(Bi-Modal)角能量分布情况下的近似运算。通过分析这些新方法的近似效率,可以得到计算简单、复杂度低、而且符合实际的MIMO相关信道矩阵,对系统级的快速高效计算法的研究和系统级的评估以及误差分析具有重要的意义。  相似文献   

15.
In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal (200) (2d = 0.4027 nm) is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line(w), the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line(x), the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines(y), the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line(z) in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line(q) in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution(λ/△ 2) is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.  相似文献   

16.
High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET > PDMAT > TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.  相似文献   

17.
Integrated circuits (ICs) intended for increasingly sophisticated automotive applications bring unique test demands. Advanced ICs for applications such as highly integrated automatic braking system (ABS) and airbag controllers combine high voltage digital channels, significant VI demands and precise timing capability. Along with continued missioncritical reliability concerns, the trend toward higher voltage operation and increased device integration requires specialized test capabilities able to extend across the wide operating ranges found in automotive applications. Among these capabilities, automotive test requirements increasingly dictate a need for a cost-effective versatile mixed-signal pin electronics with very high data rates reaching up to 50MHz with a voltage swing of-2 V to +28 V.  相似文献   

18.
This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.  相似文献   

19.
An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.  相似文献   

20.
It is of interest to get appropriate information about the dynamic behaviour of rotating machinery parts in service. This paper presents an approach of optical vibration and deviation measurement of such parts. Essential of this method is an image derotator combined with a high speed camera or a laser doppler vibrometer (LDV).  相似文献   

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