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W波段InGaAs/InP动态二分频器 总被引:1,自引:0,他引:1
采用fT=214 GHz,fmax=193 GHz的InGaAs/InP异质结双极型晶体管工艺,设计了一款基于时钟驱动型反相器的动态二分频器.该分频器工作频段为60 ~ 100 GHz,但由于测试系统上限频率的限制,只能测出62 ~ 83 GHz的工作范围.在-4.2V和-5.2 V的单电源直流偏置下该分频器的功耗分别为596.4 mW、1060.8 mW.此分频器的成功制作对于工作在W波段锁相环的构建有较大的意义. 相似文献
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在传统Doherty功率放大器的基础上,采用砷化镓(GaAs)异质结双极晶体管(HBT)工艺,设计了一款可应用于5G通信N79频段(4.4~5 GHz)的高回退效率MMIC Doherty功率放大器(DPA)。通过在Doherty电路中采用共射-共基结构,并在共射-共基结构中加入共基极接地电容,大幅提升了DPA的增益和输出功率。使用集总元件参与匹配,减小了芯片的面积。仿真结果表明,在目标频段内,增益大于28 dB,饱和输出功率约为38 dBm,饱和附加效率(PAE)为63%,7 dB回退处的效率达到43%。 相似文献
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A 6 GHz voltage controlled oscillator (VCO) optimized for power and noise performance was designed and characterized. This VCO was designed with the negative-resistance (Neg-R) method, utilizing an InGaP/GaAs hetero-junction bipolar transistor in the negative-resistance block. A proper output matching network and a high Q stripe line resonator were used to enhance output power and depress phase noise. Measured central frequency of the VCO was 6.008 GHz. The tuning range was more than 200 MHz. At the central frequency, an output power of 9.8 dBm and phase noise of -122.33 dBc/Hz at 1 MHz offset were achieved, the calculated RF to DC efficiency was about 14%, and the figure of merit was -179.2 dBc/Hz. 相似文献
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A 6 GHz voltage controlled oscillator (VCO) optimized for power and noise performance was designed and characterized. This VCO was designed with the negative-resistance (Neg-R) method, utilizing an InGaP/GaAs hetero-junction bipolar transistor in the negative-resistance block. A proper output matching network and a high Q stripe line resonator were used to enhance output power and depress phase noise. Measured central frequency of the VCO was 6.008 GHz. The tuning range was more than 200 MHz. At the central frequency, an output power of 9.8 dBm and phase noise of-122.33 dBc/Hz at 1 MHz offset were achieved, the calculated RF to DC efficiency was about 14%, and the figure of merit was -179.2 dBc/Hz. 相似文献
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正An 88 nm gate-length In_(0.53)Ga_(0.47)As/In_(0.52)Al_(0.48)As InP-based high electron mobility transistor (HEMT) was successfully fabricated with a gate width of 2×50μm and source-drain space of 2.4μm.The T-gate was defined by electron beam lithography in a trilayer of PMMA/A1/UⅧ.The exposure dose and the development time were optimized,and followed by an appropriate residual resist removal process.These devices also demonstrated excellent DC and RF characteristics:the extrinsic maximum transconductance,the full channel current, the threshold voltage,the current gain cutoff frequency and the maximum oscillation frequency of the HEMTs were 765 mS/mm,591 mA/mm,-0.5 V,150 GHz and 201 GHz,respectively.The HEMTs are promising for use in millimeter-wave integrated circuits. 相似文献
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