一种全负载稳定的高PSRR LDO的设计北大核心CSCD

提出了一种高电源纹波抑制比的低压差线性稳压器.该低压差线性稳压器通过提高带隙基准的电源抑制比以达到提高LDO(低压差线性稳压器)低频电源纹波抑制的能力.在TSMC 0.18μm CMOS工艺下进行了仿真验证,仿真结果表明,该LDO最大负载电流可以达到80mA,当负载电流在0~80mA范围内变化时,开环相位裕度均大于64°,证明了低压差线性稳压器的高稳定性.当负载电流从0mA跳变到80mA时,系统的输出电压过冲仅为15mV,环路响应时间仅为0.5μs.当负载电流为80mA,测得10kHz时的电源纹波抑制比为-60.82dB,100kHz时LDO的电源纹波抑制比为-57.66dB.     

车规级LIN总线中55V摆率增强型LDO

针对传统车载芯片中高压型低压差线性稳压器(LDO)的负载电流小、电源抑制比低、瞬态响应差等问题,提出了一种增强型高压LDO,通过一种新型高压预调制电路,提高了高压LDO的电源抑制比;通过一种新型摆率增强电路,改善了高压LDO的瞬态响应。电路基于BCD-120 V CMOS工艺完成建模,仿真结果显示,电压可调范围为5.5～55 V,输出5 V;负载电流为800 mA;低频电源抑制比为96 dB;1μs内负载电流从1 mA跳变到800 mA时,输出端最大上冲电压为26.6 mV,响应时间为8μs;下冲电压为45.4 mV,响应时间为7μs,满足车规级局域互联网(LIN)总线中高压LDO的性能要求。     

一种瞬态响应增强的片上LDO系统设计

分析了传统LDO提高系统稳定性及瞬态响应的局限性,提出了一种片内集成补偿技术。该技术无需外挂电容和等效串联电阻(ESR),即可使系统在全负载范围内保持稳定,并具有良好的纹波抑制能力。仿真结果表明,系统空载时静态电流为46μA,且能提供200mA的最大负载电流,低频电源抑制比达到-65.6dB,启动时间只有16μs,在输出电容为10pF、负载电流以200mA/2μs突变时,最大下冲电压为120mV,上冲电压为160mV。     

一种快速瞬态响应的无片外电容型LDO电路设计

本文基于SMIC65 nm工艺,设计了一款快速瞬态响应的无片外电容型低压差线性稳压器(low dropout regulator,LDO).采用高增益跨导结构(OTA)的误差放大器,利用局部共模反馈结构(CFRFC),增加了放大器跨导率,提高了放大器的直流增益.同时,引入一个由电容耦合电流镜构成的瞬态检测电路,取代了传统LDO电路中的大电容,便于检测输出的跳变,增大对功率管的充放电能力,提高了环路瞬态响应速度,降低LDO环路的上/下冲电压.缓冲级采用了带电压负反馈的源级跟随器,在一定的静态功耗下,提高了动态电流,将次级点推到更高的频率,提高了电路相位裕度.仿真结果表明,输入电压为2～3 V时,该电路输出为1.2 V,最大负载电流为100 mA;当负载电流在0～100 mA时,LDO输出的最大过冲电压和欠冲电压为23 mV和27 mV,并且在低频时有较高的电源抑制比.     

一种缓冲器阻抗动态调整的LDO

提出了一种缓冲器阻抗动态调整的LDO结构。采用并联负反馈和阻抗动态调整技术,显著降低了缓冲级的输出阻抗,没有增加额外的静态电流,功率管栅极极点始终远在单位增益带宽之外,对稳定性没有影响。该缓冲级增大了功率管栅极的摆率,提高了LDO瞬态响应性能。基于TSMC 0.18 μm 3.3 V CMOS工艺进行设计,该LDO的输出电压为1.8 V,压差电压为0.2 V,最大输出电流为100 mA。仿真结果显示,LDO的静态电流只有5 μA,当负载电流在10 ns内从0 mA跳变到100 mA时,输出欠冲和过冲电压分别为88.2 mV和34.8 mV。     

快速瞬态响应低噪声无片外电容LDO

针对便携式设备快速瞬态响应、低噪声、高电源抑制比等应用需求,提出了一种无片外电容NMOS型低压差线性稳压器(LDO)。该LDO基于浮栅结构,通过具有推挽输出级的放大器辅助控制,减小了电荷泵的噪声耦合;另外,通过取样输出电流控制误差放大器的输出动态范围,极大地提高了电路的瞬态响应能力。电路基于HHGrace 0.35μm BCD工艺设计,仿真结果表明,无外接电容时,负载电流在1μA～400 mA之间跳变,电路的下冲电压为203 mV,过冲电压为101 mV,响应时间小于1.5μs;在10 Hz～100 kHz的频段内,系统输出积分噪声电压为14μV·Hz^-1/2。LDO达到了快速瞬态响应和低噪声的需求。     

一种带瞬态响应增强的无电容型LDO

在传统无电容型LDO的基础上,设计了一种带瞬态增强的无电容型LDO。采用频率补偿方案,有效减小所需的片上补偿电容,节约了芯片面积。采用了过冲/下冲检测电路,用于检测负载瞬间变化时输出电压的变化,通过调节功率管栅极电压,提升了LDO的瞬态响应速度。采用0.13 μm标准CMOS工艺,对设计的瞬态增强无电容型LDO进行仿真验证。结果表明,片上补偿电容为2 pF时,系统静态电流为30 μA,当负载在1 μs内从1 mA变化到50 mA时,输出电压过冲为88 mV,下冲为50 mV,与不带过冲/下冲检测电路的LDO相比,分别提高了56%和54%。     

电源

低静态电流LDO ADP124和ADP125在100kHz时均具有60dB的PSRR电源抑制比,并且在1.8V输出时可实现35μVrms的低噪声性能。新款LDO的输入电压范围为2.3～5.5V,输出电流最高可达500mA,输出电压最低为0.8V,静态电流低至210μA,500mA负载时的电压差为130mV,这些特性能够进一步提高便携式设备在宽输入电压范围内的工作效率。ADP124提供1.75～3.3V范围内的31种固定输出电压选项。ADP125利用低静态电流LDO     

一种高稳定性高精度低压差线性稳压器的分析与设计

提出了LDO,其基于缓慢滚降式频率补偿方法,通过在电路中引入三个极零对（极零对的产生没有增加静态功耗）,不仅克服了常规LDO不能使用低等效串联电阻、低成本陶瓷输出电容的缺点,而且确保了系统在整个负载和输入电压变化范围内稳定工作。由于LDO通常给高性能模拟电路供电,因此其输出电压精度至关重要； 而该补偿方法能满足高环路增益、高单位增益带宽的设计要求,从而大幅提高LDO的精度，该LDO基于0.5μm CMOS工艺实现，后仿结果表明,即使在低压满负载条件下,其开环DC增益仍高于70dB,满载时单位增益带宽可达3MHz,线性调整率和负载调整率分别为27μV/V和3.78μV/mA,过冲和欠冲电压均小于30mV,负载电流为150mA时的漏失电压（dropout电压）仅为120mV。     

一种适用于SoC的瞬态增强型线性稳压器

为满足SoC系统负载快速变化的要求,提出了一种新型摆率增强型片上LDO系统。通过增加有效的内部检测电路,使LDO的功率管栅极电压可以快速地响应输出负载跳变,提高电路响应速度。采用中芯国际40 nm CMOS工艺模型,对电路进行仿真。仿真结果表明,当LDO的负载电流以100 mA/μs跳变时,电路的最大上冲电压为110 mV,下冲电压为230 mV,恢复时间分别为1.45 μs和1.6 μs。同时,在2 V电源电压下,电路的静态电流只有42 μA。     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.     

An improved parallel thinning algorithm with two subiterations

The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.     

Theoretical analysis of the relationship between the Brillouin gain coefficient and the strain in the optical-fiber sensors

The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.     

Novel fiber-optical interferometer with miniaturized probe for in-hole measurements

Today, micro-system technology and the development of new MEMS （Micro-Electro-Mechanical Systems） are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.     

Study of waveguide coupling efficiency in hybrid silicon lasers

This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel＇s.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

Critical Stage Rule-Based Real Time Dispatch（RTD）System in Highly-Mixed-Products （HMP） FAB

An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.