塑料芯片的红外激光加热键合研究

阐述了利用红外激光与物质相互作用的热效应实现微系统器件的局部加热键合原理 ,研究了红外激光键合塑料芯片的实施条件和键合工艺过程 ,建立了半导体激光键合实验装置 ,并实现了有机玻璃芯片的激光键合。以非硅塑料材料为主的加工工艺在微流芯片及生物芯片的研究日益受到重视 ,形成了一类新的生化微系统器件。塑料高分子材料不仅具有与生物分子化学兼容的优点 ,而且塑料种类繁多 ,价格低廉 ,且易于通过模压、注射成型和其他复制技术实现大规模低成本的生产 ,克服了以硅或玻璃材料为主的加工工艺生产生物微系统的高成本低产量的局限性。随着…     

应用于微系统封装的激光局部加热键合技术

阐述了利用激光与物质相互作用的热效应实现微系统器件的局部加热键合原理，提出了激光键合塑料芯片和激光辅助加热阳极键合的思想，建立了半导体激光键合实验装置，并实现了聚甲基丙烯酸甲酯(PMMA)之间的键合。     

应用于微系统封装的激光局部加热键合技术

阐述了利用激光与物质相互作用的热效应实现微系统器件的局部加热键合原理 ,提出了激光键合塑料芯片和激光辅助加热阳极键合的思想 ,建立了半导体激光键合实验装置 ,并实现了聚甲基丙烯酸甲酯 (PMMA)之间的键合     

应用于微系统封装的激光局部加热键合技术

阐述了利用激光与物质相互作用的热效应实现微系统器件的局部加热键合原理,提出了激光键合塑料芯片和激光辅助加热阳极键合的思想,建立了半导体激光键合实验装置,并实现了聚甲基丙烯酸甲酯(PMMA)之间的键合.     

基于钛中间层的玻璃与硅激光键合互联技术

采用纳秒脉冲式紫外激光实现了含有金属中间层的玻璃与硅激光键合互联。基于激光键合的二维传热模型，通过有限元分析仿真阐述了钛中间层的作用机理。开展了钛中间层薄膜制备及激光键合工艺试验，对比了键合强度，并通过微观形貌和能谱分析，验证了钛中间层在激光键合的有益作用。最终制备了含有6μm中间金属互联层的玻璃-金属-硅键合互联结构。     

Si/Glass激光键合的仿真及实验研究

对Si/Glass激光键合进行了有限元仿真,自主设计激光键合系统并进行了Si/Glass激光键合实验研究、测试与表征。以Si/Glass激光键合的二维传热解析模型为理论基础,应用有限元软件ANSYS仿真了激光功率20～48W时激光键合的三维温度场、键合熔融深度,并预测键合阈值功率为28 W。自主设计激光键合系统及实验方案,采用光斑直径150μm、功率30W的Nd:YAG连续激光实现了Si/Glass的良好激光键合。测试结果表明,激光键合强度最高为阳极键合的5.2倍,激光键合腔体气密性测试泄漏率平均值约9.29×10-9 Pa.m3/s,与阳极键合处于同一数量级。采用能谱分析(EDS)线扫描Si/Glass激光键合的界面材料成分,发现键合界面形成过渡层,激光功率30W时过渡层厚度9μm,与仿真结果吻合。     

MEMS封装用局部激光键合法及其实现

对常规激光键合在Si-玻璃键合工艺中因高温而引起的负面效应进行了分析,从而设计出芯片表面活化预键合与激光键合工艺相结合的方法.该方法已用于微电子机械系统(MEMS)样片封装实验中.实验过程是:先用一种特殊的化学方法形成亲水表面,然后将Si和玻璃置于室温下进行预键合,最后取波长1064nm、光斑直径500μm、功率70W的Nd∶YAG激光器作局部激光加热.结果表明,该方法在不施加外力下能实现无损伤低温键合,同时拉伸实验也说明了样片键合强度达到2.6～3.0MPa,从而既保证了MEMS芯片的封装质量又降低了其封装成本.     

激光键合的有限元仿真及工艺参数优化

在硅/玻璃激光键合中,温度场的分布是影响晶片能否键合的关键因素.本文利用有限元法建立了移动高斯热源作用下硅/玻璃激光键合的三维温度场数值分析模型.运用该模型计算了不同的工艺参数条件下硅/玻璃的温度场分布,并由此得出键合线宽.然后通过漏选试验确定影响激光键合的主要工艺参数有激光功率、激光扫描速度及键合初始温度.最后通过对仿真结果进行回归分析,得到激光键合工艺的最优参数,为进一步研究激光键合工艺提供了理论依据.     

激光键合的有限元仿真及工艺参数优化

在硅/玻璃激光键合中,温度场的分布是影响晶片能否键合的关键因素.本文利用有限元法建立了移动高斯热源作用下硅/玻璃激光键合的三维温度场数值分析模型.运用该模型计算了不同的工艺参数条件下硅/玻璃的温度场分布,并由此得出键合线宽.然后通过漏选试验确定影响激光键合的主要工艺参数有激光功率、激光扫描速度及键合初始温度.最后通过对仿真结果进行回归分析,得到激光键合工艺的最优参数,为进一步研究激光键合工艺提供了理论依据.     

高芯片键合质量与高生产率的新型银浆体系的研究

高键合强度与高生产率的银浆体系是芯片实现小型化、轻薄化的基础,本文研发了一种高芯片键合强度的新型银浆体系(银浆B),通过五元素三水平(53)正交实验,探讨了银浆量、点胶高度、芯片键合力、银浆固化时间、固化温度等五因素对芯片键合强度及结构的影响;以及基于实验设计(DOE)和响应曲面分析(RSM)等统计方法,分析了芯片键合的过程,优化了芯片键合过程的固化时间、固化温度和银浆量等参数。采用银浆B体系以及优化的制程参数,使得芯片键合强度制程能力指数(Cpk)从0.56提高到2.8。     

MEMS局部加热封装技术与应用

随着半导体技术的发展,封装集成度不断提高,迫切需要发展一种低温封装与键合技术,满足热敏器件封装和热膨胀系数差较大的同质或异质材料间的键合需求。针对现有整体加热封装技术的不足,首先介绍了局部加热封装技术的原理与方法,然后对电流加热、激光加热、微波加热、感应加热和反应加热等几种局部加热封装技术进行了比较分析,最后具体介绍了局部加热封装技术在热敏器件封装、MEMS封装和异质材料集成等方面的应用。由于局部加热封装技术具有效率高、对器件热影响小等优点,有望在MEMS技术、系统封装(SiP)、三维封装及光电集成等领域得到广泛应用。     

微系统感应局部加热封装与键合设计

整体加热封装(即封装过程中整个衬底、芯片、键合层都处于加热状态),不仅工艺时间长,而且高温会对衬底上温度敏感的微结构和电路产生热损坏,或者因为热膨胀系数不匹配导致键合区热应力增大,影响器件可靠性。首先对电磁感应加热实现微系统局部加热封装进行了论述,重点对感应局部加热键合原理、电源选择、感应器和键合层设计,以及键合过程中的温度测试等方面进行了设计分析。对于感应局部加热键合而言,键合区必须设计成封闭环形,其宽度应大于临界尺寸,并且存在一个最佳频率范围。根据键合层材料和结构不同,感应局部加热可用于焊料键合、共晶键合、扩散键合,以实现微系统器件的封装和结构制作。     

Wafer-level packaging of silicon to glass with a BCB intermediate layer using localised laser heating

Adhesive wafer-level bonding is an excellent solution to meet the stringent requirements in micro-electro-mechanical systems (MEMS) packaging, one of the challenges in MEMS manufacturing, in a steadily growing micro-systems market. A range of bonding processes for commercially available substrate bonders have been developed, which apply global heating during the bonding procedure. This article, however, describes an approach where heating is kept to a minimum by combining the merits of laser joining, a truly localised heating technique, and adhesive wafer-level bonding. This unique bonding technique, which enables the use of temperature-sensitive materials within the package, is demonstrated for bonding of silicon to glass - materials commonly used in MEMS fabrication - with a benzocyclobutene (BCB) intermediate bonding layer. As a proof of concept for wafer-level packaging, bonding of two simplified patterns is demonstrated, one with five individual samples on the same wafer, and the other with nine samples. To verify the influence of this innovative bonding technique on the quality of the seal the devices are shear force tested and the results are compared with those of devices packaged at chip-level.     

引线键合技术进展

引线键合以工艺简单、成本低廉、适合多种封装形式而在连接方式中占主导地位.对引线键合工艺、材料、设备和超声引线键合机理的研究进展进行了论述与分析,列出了主要的键合工艺参数和优化方法,球键合和楔键合是引线键合的两种基本形式,热压超声波键合工艺因其加热温度低、键合强度高、有利于器件可靠性等优势而取代热压键合和超声波键合成为键合法的主流,提出了该技术的发展趋势,劈刀设计、键合材料和键合设备的有效集成是获得引线键合完整解决方案的关键.     

A Novel Wafer-Level Hermetic Packaging for MEMS Devices

Some emerging microelectromechanical systems (MEMS) devices such as high-performance inertial sensors and high-speed actuators must be operated in a high vacuum and in order to create this vacuum environment, specific packaging is required. To satisfy this demand, this paper presents a novel method for hermetic and near-vacuum packaging of MEMS devices. We use wafer-level bonding technology to combine with vacuum packaging, simultaneously. For this packaging solution, the wafers with air-guided micro-through-holes were placed on a custom-built design housed in a vacuum chamber maintained at a low-pressure environment of sub-10 mtorr. Packaging structure is then sealed by solder ball reflow process with the lower heating temperature of 300degC to fill up micro-through-hole. Experimental results shown the hermetical packaging technique using solder sealing is adapted to the wafer-level microfabrication process for MEMS devices and can achieve better yield and performance. Thus, this technique is very useful for many applications with high performance and low packaging cost can be obtained due to wafer-level processing.     

Selective bonding and encapsulation for wafer-level vacuum packaging of MEMS and related micro systems

A laser-assisted bonding technique is demonstrated for low temperature region selective processing. A continuous wave carbon dioxide (CO₂) laser (λ=10.6 μm) is used for solder (Pb37/Sn63) bonding of metallized silicon substrates (chips or wafers) for MEMS applications. Laser-assisted selective heating of silicon led to the reflow of an electroplated, or screen-printed, intermediate solder layer which produced silicon–solder–silicon joints. The bonding process was performed on fixtures in a vacuum chamber at an air pressure of 10⁻³ Torr to achieve fluxless soldering and vacuum encapsulation. The bonding temperature at the sealing ring was controlled to be close to the reflow temperature of the solder. Pull test results showed that the joint was sufficiently strong. Helium leak testing showed that the leak rate of the package met the requirements of MIL-STD-883E under optimized bonding conditions and bonded packages survived thermal shock testing. The testing, based on a design of experiments method, indicated that both laser incident power and scribe velocity significantly influenced bonding results. This novel method is especially suitable for encapsulation and vacuum packaging of chips or wafers containing MEMS and other micro devices with low temperature budgets, where managing stress distribution is important. Further, released and encapsulated devices on the sealed wafers can be diced without damaging the MEMS devices at wafer level.     

塑料生物芯片的激光焊接封装系统研究

介绍了采用半导体激光器在塑料生物芯片焊接封装系统的应用 ,论述了塑料生物芯片焊接封装原理和工艺 ,提出了基于 80 8nm半导体激光器的塑料焊接封装系统的设计方法 ,分析了焊接封装的参数选择 ,实现了部分塑料之间的成功焊接     

Localized bonding processes for assembly and packaging of polymeric MEMS

Localized bonding schemes for the assembly and packaging of polymer-based microelectromechanical systems (MEMS) devices have been successfully demonstrated. These include three bonding systems of plastics-to-silicon, plastics-to-glass, and plastics-to-plastics combinations based on two bonding processes of localized resistive heating: 1) built-in resistive heaters and 2) reusable resistive heaters. In the prototype demonstrations, aluminum thin films are deposited and patterned as resistive heaters and plastic materials are locally melted and solidified for bonding. A typical contact pressure of 0.4 MPa is applied to assure intimate contact of the two bonding substrates and the localized bonding process is completed within less than 0.25 s of heating. It is estimated that the local temperature at the bonding interface can reach above 150/spl deg/C while the substrate temperature away from the heaters can be controlled to be under 40/spl deg/C during the bonding process. The approach of localized heating for bonding of plastic materials while maintaining low temperature globally enables direct sealing of polymer-based MEMS without dispensing additional adhesives or damaging preexisting, temperature-sensitive substances. Furthermore, water encapsulation by plastics-to-plastics bonding is successfully performed to demonstrate the capability of low temperature processing. As such, this technique can be applied broadly in plastic assembly, packaging, and liquid encapsulation for microsystems, including microfluidic devices.     

A cost-effective solution for packaging the arrayed waveguide grating (AWG) photonic components

Precision laser machining technology was used to cut arrayed waveguide grating (AWG) devices from 6-in wafers by following their complex profiles in a fully automatic way. A substantial cost saving in components manufacturing was achieved by an obtained device-cutting yield of 100%. The profile-cut AWG devices have smooth cutting edges and their optical performances were found unaffected by the cutting. These devices were processed in the subsequent packaging process easily without adding cost. They were proven mechanically stable in their packaging in meeting the telecommunication standards even though they have irregular geometry.