高斜效率高功率850nm氧化限制型垂直腔面发射激光器

报道了MOCVD生长的高性能850nm氧化限制型垂直腔面发射激光器．研制出的氧化直径为9μm的激光器25℃时的斜效率和阈值电流分别为0．82mW／mA和2．59mA，激光器在23mA时输出16mW最大光功率．氧化直径为5μm的激光器25℃时的最小阈值电流为570μA，其最大饱和光功率为5．5mW．     

高斜效率高功率850nm氧化限制型垂直腔面发射激光器

报道了MOCVD生长的高性能85 0 nm氧化限制型垂直腔面发射激光器.研制出的氧化直径为9μm的激光器2 5℃时的斜效率和阈值电流分别为0 .82 m W/m A和2 .5 9m A,激光器在2 3m A时输出16 m W最大光功率.氧化直径为5μm的激光器2 5℃时的最小阈值电流为5 70μA,其最大饱和光功率为5 .5 m W.     

850 nm氧化限制型VCSEL研究

通过对850nm氧化限制型垂直腔面发射激光器(VCSEL)结构的研究,研制出了满足实用要求的高性能的850nm氧化限制型VCSEL.激光器12μm和16μm氧化孔径25℃的阈值电流分别为1.2mA和1.8mA,斜效率为0.58mW/mA,微分串联电阻为35Ω和25Ω,激光器具有良好的温度特性和可靠性,可应用于1.25Gbit/s数据通信.     

新型垂直腔面发射激光器的研制北大核心CSCD

热问题是制约垂直腔面发射半导体激光器(VCSEL)的关键难题之一。为改善垂直腔面发射激光器的热特性,提高输出功率,设计并制备了一种新型内腔接触式结构VCSEL。在出光孔径为16μm时,同时制备传统结构和新型结构两种器件并对其进行测试,传统结构VCSEL的阈值电流为11.5 mA,当注入电流为34 mA时,最大输出功率达到7.3 mW;新结构器件的阈值电流为9 mA,当注入电流为35 mA时,最大输出功率达到10.2 mW;新结构的阈值电流降低了21.7%,最大输出功率提高了28%。结果表明,这种内腔接触式电极结构有望改善器件的热特性和光电性能。     

新型垂直腔面发射激光器的研制

热问题是制约垂直腔面发射半导体激光器(VCSEL)的关键难题之一。为改善垂直腔面发射激光器的热特性,提高输出功率,设计并制备了一种新型内腔接触式结构VCSEL。在出光孔径为16μm时,同时制备传统结构和新型结构两种器件并对其进行测试,传统结构VCSEL的阈值电流为11.5 mA,当注入电流为34 mA时,最大输出功率达到7.3 mW;新结构器件的阈值电流为9 mA,当注入电流为35 mA时,最大输出功率达到10.2 mW;新结构的阈值电流降低了21.7%,最大输出功率提高了28%。结果表明,这种内腔接触式电极结构有望改善器件的热特性和光电性能。     

低阈值InGaAs-GaAs应变层多量子阱激光器

采用分子束外延(MBE)和二次液相外延技术(LPE)研制出InGaAs-CaAs折射率缓变分别限制应变层多量子阱(GRINSCH-STL-MQW)掩埋异质结(BH)激光器.在宽接触阈值电流密度1 kA/cm~2的条件下,获得了很低的阈值电流,室温时,腔面未镀膜激光器的阈值电流为5.6mA.(L=120μm,CW.20℃)激射波长为9386A左右.外微分量子效率高达每面0.48mW/mA,最高输出功率大于30mW.     

1.5μm InGaAsP/InP脊型波导分布反馈激光器

用两次液相外延制备了1.5μm InGaAsP/InP脊型波导分布反馈激光器.室温下无扭折直流光功率超过6mW,阈值电流为34mA,单面外微分量子效率高达33％.在室温附近的稳定单纵模工作温度范围超过43℃,波长温度系数为0.9A/K.在1.6mW输出光功率下的静态线宽为60MHz.在1GHz正弦调制下仍为单纵模输出.     

1.74μm压应变InGaAs/InGaAsP量子阱分布反馈激光器

制备了1.74μm脊波导结构压应变InGaAs/InGaAsP量子阱分布反馈激光器.采用低压金属有机化合物气相沉积法生长器件材料,应用应变缓冲层防止In的分凝.未镀膜的腔长为300μm的器件阈值电流为11.5mA,100mA时最大输出功率为14mW,边模抑制比为33.5dB.     

硅基键合InP-InGaAsP量子阱连续激光器的研制

采用键合技术在Si基上制备了InP-InGaAsP量子阱激光器,实现了电注入室温连续工作.采用低温直接键合的方法,将Si衬底和InP-InGaAsP外延片键合在一起,并制成条宽6μm的脊波导边发射激光器.室温连续工作的1.55μm激光器阈值电流为48mA,对应的阈值电流密度和微分电阻分别为2.13kA/cm2和5.8Ω,在约220mA时输出光功率达15mW.     

硅基键合InP-InGaAsP量子阱连续激光器的研制

采用键合技术在Si基上制备了InP-InGaAsP量子阱激光器,实现了电注入室温连续工作.采用低温直接键合的方法,将Si衬底和InP-InGaAsP外延片键合在一起,并制成条宽6μm的脊波导边发射激光器.室温连续工作的1.55μm激光器阈值电流为48mA,对应的阈值电流密度和微分电阻分别为2.13kA/cm2和5.8Ω,在约220mA时输出光功率达15mW.     

离子束刻蚀法制备大功率高效率650nm AlGaInP可见光激光器

用纯Ar离子束刻蚀方法制备出大功率高效率650nm实折射率AlGaInP压应变量子阱激光器.对偏角衬底,干法刻蚀可得到湿法腐蚀不能得到的高垂直度和对称台面.制备的激光器条宽腔长分别为4μm和600μm,前后端面镀膜条件为10%/90%.室温下阈值电流的典型值为46mA,输出功率为40mW时仍可保持基横模.10mW,40mW时的斜率效率分别为1.4W/A和1.1W/A.     

980nm氧化物限制的垂直腔面发射激光器

采用低压金属有机化合物气相外延(L P- MOCVD) ,制备了顶端发射氧化物限制、内腔接触结构980 nm的垂直腔面发射激光器.应用了选择氧化和自对准工艺来实现电流限制.在2 8m A脉冲电流驱动下,器件的输出功率为10 .1m W,斜率效率为0 .4 6 2 m W/ m A.脉冲工作下,最高输出功率为13.1m W.室温连续工作下,输出功率为7.1m W,发射波长为974 nm ,光谱半宽为0 .6 nm.研究了氧化孔径对阈值电流和微分电阻的影响,结果表明较小的氧化孔径可以获得低的阈值电流.     

980nm氧化物限制的垂直腔面发射激光器

采用低压金属有机化合物气相外延(LP-MOCVD),制备了顶端发射氧化物限制、内腔接触结构980nm的垂直腔面发射激光器.应用了选择氧化和自对准工艺来实现电流限制.在28mA脉冲电流驱动下,器件的输出功率为10.1mW,斜率效率为0.462mW/mA.脉冲工作下,最高输出功率为13.1mW.室温连续工作下,输出功率为7.1mW,发射波长为974nm,光谱半宽为0.6nm.研究了氧化孔径对阈值电流和微分电阻的影响,结果表明较小的氧化孔径可以获得低的阈值电流.     

Matrices of 960-nm vertical-cavity surface-emitting lasers

Matrices of vertical-cavity surface-emitting lasers with individual addressing of elements and radiation output through a gallium arsenide substrate are implemented. Individual laser emitters with a current aperture diameter of 6–7 μm exhibit continuous-wave room-temperature lasing at a wavelength of 958–962 nm with threshold currents of 1.1–1.3 mA, differential efficiency of 0.5–0.8 mW/mA, and a maximum output power of 7.5–9 mW. The parameter variation of individual emitters within a matrix chip containing 5 × 7 elements does not exceed ±20%.     

Design and fabrication technology for arrays for vertical-cavity surface-emitting lasers

The design and fabrication technology for integrated arrays for vertical-cavity surface-emitting lasers with bottom AlGaAs/GaAs semiconductor and top AlGaO/GaAs distributed Bragg reflectors is suggested. Arrays containing 8×8 lasers with an active region based on two InGaAs quantum wells were produced. Individual emitters with an oxidized aperture of 8–10 μm in diameter demonstrate cw lasing at 960–965 nm at room temperature, with a threshold current of 1.0–2.5 mA, external efficiency of up to 0.4 mW/mA, and a maximum output power of over 2 mW.     

大功率低阈值980nm单模AlGaInAs/AlGaAs量子阱激光器

To achieve low threshold current as well as high single mode output power,a graded index separate confinement heterostructure(GRIN-SCH)AlGaInAs/AlGaAs quantum well laser with an optimized ridge waveguide was fabricated.The threshold current was reduced to 8 mA.An output power of 76 mW was achieved at100 mA current at room temperature,with a slope efficiency of 0.83 W/A and a horizon divergent angle of 6.3.The maximum single mode output power of the device reached as high as 450 mW.     

单模AlGaAs／GaAs脊形波导量子阱半导体激光器

本文报道用分子束外延设备研制梯度折射率分别限制式单量子阱AlGaAs/GaAs脊形波导半导体激光器。该激光器具有良好的性能,条宽5μm器件室温阈值电流23mA,线性连续输出单模激光功率大于15mW。     

1.3-μm GaInAsN Vertical-Cavity Surface-Emitting Lasers by Oxide-Planarized and Surface-Relief Processes for Single-Mode Operation

In this letter, we investigate and characterize the 1.3-mum single-mode vertical-cavity surface-emitting lasers (VCSELs) with two GaInAsN strained multiple quantum wells as the active region. Surface relief technique and a thick silicon oxide were used for the spatial mode filtering and the planarization processing, respectively. The VCSELs with a 5-mum-diameter surface-relief aperture and a 12-mum-diameter oxide-confined aperture at room temperature exhibit a threshold current of 3 mA, a slope efficiency of 0.14 mW/mA, a maximum operation temperature of 90 degC, and a single-mode behavior. These VCSELs show a maximum light output power of 1 mW for the single fundamental mode with a transverse-mode suppression of more than 30 dB and also show a clear eye-opening feature operated at 2.488 Gb/s and 12.6 mA     

980nm垂直腔面发射激光器的研制

采用低压金属有机化合物气相外延生长技术,应用AlAs/AlGaAs选择性湿氮氧化工艺实现光、电限制，制备出具有一定性能的980nm内腔接触式氧化物限制型顶发射980nm垂直腔面发射激光器(VCSEL). 通过制备不同氧化孔径尺寸的VCSEL，分析了氧化孔径尺寸大小对器件的阈值电流和串联电阻的影响. 获得的最小阈值电流为0.8mA，最大光输出功率达8mW.     

High output power and high temperature operation of 1.5 μmDFB-PPIBH laser diodes

Highly efficient 1.5-μm distributed-feedback (DFB) p-substrate partially-inverted buried heterostructure laser diodes with a thin active layer developed using a metal-organic chemical vapor deposition technique are discussed. An average slope efficiency of 0.26 mW/mA (quantum efficiency 33%) and maximum slope efficiency of 0.39 mW MW/mA (49%) were achieved. The full width at half maximum in the direction perpendicular to the junction plane of 25° was obtained. A high output power of 77 mW was obtained under CW conditions at room temperature. This laser diode lased up to 120°C, and more than 10 mW was obtained, even at 90°C