自适应偏置SOI CMOS功率放大器的设计

基于IBM 0.18 μm SOI CMOS工艺,设计了一款用于WLAN的高效率CMOS功率放大器。为了提高电路的可靠性,该放大器的驱动级和输出级均采用自适应偏置电路,使得共栅管和共源管的漏源电压分布更为均衡。该芯片采用两级共源共栅结构,片内集成了输入匹配电路和级间匹配电路。测试结果表明,该放大器的增益为23.9 dB,1 dB压缩点为23.9 dBm,效率为39.4%。当测试信号为IEEE 802.11g 54 Mb/s,在EVM为3%处,输出功率达到16.3 dBm。     

一个自偏压互补折叠式共源共栅放大器的设计

对传统CMOS折叠式共源共栅运算放大器进行分析和总结,利用自偏压互补折叠技术实现了一种高性能CMOS自偏压互补折叠式共源共栅运算放大器。这个设计消除了6个外部偏置电压,减小了供电电压,并且提高了输出摆幅和开环增益,同时,使用这个方案还可以使芯片面积、功耗、偏置部分对噪声和串扰的灵敏度降低,最后描述了设计过程并给出了设计的仿真结果,证实该结构的可行性。     

基于0.13μm CMOS的WiFi功率放大器设计

基于TSMC 0.13 μm CMOS工艺,设计了一款适用于无线保真(WiFi)收发机的发射端、工作在2.4 GHz且增益可控的三级级联功率放大器.驱动级采用单管结构,后两级采用共源共栅(MOSFET)结构.利用调节共源共栅晶体管栅极的电容来改变栅极电压的相位,进而弥补了共源共栅结构的劣势,增加了整个系统的线性度和增益.另外,使用外部数字信号控制每级偏置的大小来适应不同的输出需求.整个结构采用电源电压:第一级为1.8V,后两级为3.3V,芯片面积为1.93 mm×1.4 mm.利用Candence Spectre RF软件工具对所设计的功率放大器进行仿真.结果表明,在2.4 GHz的工作频点,功率放大器的饱和输出功率为24.9 dBm,最大功率附加效率为22％,小信号增益达到28 dB.     

一种自偏置低压共源共栅带隙基准电路设计

随着CMOS工艺的发展,器件尺寸逐渐缩小,短沟道效应的影响日益突出。共源共栅电流源可以很好地抑制小尺寸效应,但其消耗的电压余度较大,偏置电路设计繁琐。因此介绍了一种采用自偏置低压共源共栅电流源的带隙基准电路结构,用两个电阻代替了偏置电路。仿真结果显示,该带隙基准电路的最低电源电压约为2.98V,相对于普通的共源共栅结构,降低了2个MOSFET阈值电压;工作在最低电源电压下,功耗约为270μW,相对于带偏置电路的结构,降低约75μW。仿真结果证明,该电路能够简化共源共栅电路的设计和调试,并减少低压共源共栅电路的功耗。     

折叠式共源共栅运算放大器的0.6μm CMOS设计

折叠式共源共栅结构的运算放大器不仅能提高增益、增加电源电压噪声抑制能力,而且在输出端允许自补偿.基于0.6μm CMOS工艺,验证了一种折叠共源共栅的运算放大器的参数指标.理论计算和实际分析相结合,仿真结果达到设计指标要求.     

提高共源共栅CMOS功率放大器效率的方法

利用共源共栅电感可以提高共源共栅结构功率放大器的效率。这里描述了一种采用共源共栅电感提高效率的5.25 GHz WLAN的功率放大器的设计方法,使用CMOS工艺设计了两级全差分放大电路,在此基础上设计输入输出匹配网络,然后使用ADS软件进行整体仿真,结果表明在1.8 V电源电压下,电路改进后与改进前相比较,用来表示功率放大器效率的功率附加效率(PAE)提高了两个百分比。最后给出了功放版图。     

一种用于5G通信的高稳定双模功率放大器

采用国产40 nm CMOS工艺,设计了一种用于5G通信的28 GHz双模功率放大器。功率级采用大尺寸晶体管,获得了高饱和输出功率。采用无中心抽头变压器,消除了大尺寸晶体管带来的共模振荡问题。在共源共栅结构的共栅管栅端加入大电阻,提高了共源共栅结构的高频稳定性。采用共栅短接技术,解决了大电阻引起的差模增益恶化问题。在级间匹配网络中采用变容管调节,实现了双模式工作,分别获得了高功率增益和高带宽。电路后仿真结果表明,在高增益模式下,该双模功率放大器获得了20.8 dBm的饱和输出功率、24.5%的功率附加效率和28.1 dB的功率增益。在高带宽模式下,获得了20.6 dBm的饱和输出功率、22.6%的功率附加效率和12.2 GHz的3 dB带宽。     

音频功放芯片中AB类输出运放的设计

采用0.6μm DPDM工艺,设计出一款在静态功耗、失调电压、输出摆幅、输出功率、THD、速度和带宽等各方面性能都比较优良的AB类CMOS输出运算放大器,其主要应用于音频功放芯片。采用推挽式功率管输出,其主体部分采用折叠式共源共栅差分电路结构,偏置部分采用外部电流源供电,并使用共源共栅电流镜结构。供电电压为3~5 V,在5 V下的静态功耗为6 mW。能驱动32Ω耳机,其最大输出功率是90 mW。仿真结果表明,电路性能优良。     

一种折叠共源共栅运算放大器的设计

折叠共源共栅运放结构的运算放大器可以使设计者优化二阶性能指标,这一点在传统的两级运算放大器中是不可能的。特别是共源共栅技术对提高增益、增加PSRR值和在输出端允许自补偿是有很用的。这种灵活性允许在CMOS工艺中发展高性能无缓冲运算放大器。目前,这样的放大器已被广泛用于无线电通信的集成电路中。介绍了一种折叠共源共栅的运算放大器,采用TSMC 0.18混合信号双阱CMOS工艺库,用HSpice W 2005.03进行设计仿真,最后与设计指标进行比较。     

低温漂系数共源共栅CMOS带隙基准电压源

设计了一种低温漂系数的共源共栅CMOS带隙基准源,采用自偏置共源共栅结构,提高了电路的电源抑制比,降低了电路的工作电源电压。采用不同温度下从输出支路抽取不同值电流的电路结构,在低温段抽取一个正温度系数电流,在高温段再注入一个较小值的正温度系数电流,达到降低温漂系数的目的。在0.5 μm CMOS工艺下,Cadence Spectre电路仿真的结果表明,温度特性得到了较大改善,在-35℃～125℃温度范围内,带隙基准源的温漂系数为1.5 ×10-6 /℃,电源抑制比为65 dB。     

Technology innovation and process integrations for sub-100nm gate patterning

This paper presents a brief overview of the Applied Centura(R)DPS(R)system,configured with silicon etch DPS Ⅱ chamber, with emphasis on discussing tuning capability for CD uniformity control. It also presents the studies of etch process chemistry and film integration impact for an overall successful gate patterning development. Discussions will focus on resolutions to key issues, such as CD uniformity, line-edge roughness, and multilayer film etching integration.     

White organic light-emitting devices based on fac tris（2- phenylpyridine） iridium sensitized 5,6,11,12-tetraphenylnap -hthacene

We have fabricated the white organic light-emitting devices （WOLEDs） based on 4,4＇ -bis（2,2 -diphenyl vinyl）-1,1＇ - biphenyl （DPVBi） and phosphorescence sensitized 5,6,11,12,-tetraphenylnaphthacene （rubrene）. The device structure is ITO/2T-NATA （20 nm）/NPBX （20 nm）/CBP： x%Ir（ppy）3：0.5% rubrene （8 nm）/NPBX （5 nm）/DPVBi （30 nm）/Alq（30 nm）/LiF（0.5 nm）/A1. In the devices, DPVBi acts as a blue light-emitting layer, the rubrene is sensitized by a phosphorescent material, fac tris （2-phenylpyridine） iridium [Ir（ppy）3], acts as a yellow light-emitting layer, and N,N＇ -bis- （1-naphthyl）- N,N＇ -diphenyl -1, 1＇ -biphenyl-4,4＇ -diamine （NPBX） acts as a hole transporting and exciton blocker layer, respectively. When the concentration of Ir （PPY）3 is 6wt%, the maximum luminance is 24960 cd/m^2 at an applied voltage of 15 V, and the maximum luminous efficiency is 5.17 cd/A at an applied voltage of 8 V.     

Complete approach to automatic identification and subpixel center location for ellipse feature

To meet the need of automatic image features extraction with high precision in visual inspection, a complete approach to automatic identification and sub-pixel center location for similar-ellipse feature is proposed. In the method, the feature area is identified automatically based on the edge attribute, and the sub-pixel center location is accomplished with the leastsquare algorithm. It shows that the method is valid, practical, and has high precision by experiment. Meanwhile this method can meet the need of instrumentation of visual inspection because of easy realization and without man-machine interaction.     

小角度扩展相关性近似算法分析

本论文提出一种在多天线MIMO信道相关性建模中小角度扩展近似理论算法,并应用于分析MIMO系统性能。分析中分别对三种不同角能量分布情况下的空间相关性研发快速近似计算法,并同时提出双模(Bi-Modal)角能量分布情况下的近似运算。通过分析这些新方法的近似效率,可以得到计算简单、复杂度低、而且符合实际的MIMO相关信道矩阵,对系统级的快速高效计算法的研究和系统级的评估以及误差分析具有重要的意义。     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

A Versatile Mixed-Signal Pin Approach for Cost-Effective Test of Automotive ICs

Integrated circuits (ICs) intended for increasingly sophisticated automotive applications bring unique test demands. Advanced ICs for applications such as highly integrated automatic braking system (ABS) and airbag controllers combine high voltage digital channels, significant VI demands and precise timing capability. Along with continued missioncritical reliability concerns, the trend toward higher voltage operation and increased device integration requires specialized test capabilities able to extend across the wide operating ranges found in automotive applications. Among these capabilities, automotive test requirements increasingly dictate a need for a cost-effective versatile mixed-signal pin electronics with very high data rates reaching up to 50MHz with a voltage swing of-2 V to +28 V.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

Critical Stage Rule-Based Real Time Dispatch（RTD）System in Highly-Mixed-Products （HMP） FAB

An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.     

Optical vibration and deviation measurement of rotating machine parts

It is of interest to get appropriate information about the dynamic behaviour of rotating machinery parts in service. This paper presents an approach of optical vibration and deviation measurement of such parts. Essential of this method is an image derotator combined with a high speed camera or a laser doppler vibrometer （LDV）.