近等原子比TiNi合金薄膜的组织及相变动态观察

采用磁控溅射法制备TiNi非晶薄膜。通过X射线衍射（XRD）、透射电子显微镜（TEn）等方法研究了TiNi合．金薄膜的组织形貌、电子衍射花样，并对其相变过程进行了动态观察。结果表明：态薄膜为非晶态，对其在515℃进行1h的晶化处理后，薄膜中析出了TiNi3相；晶化处理后的TiNi合金薄膜加热到100℃时，薄膜中R相和马氏体相以切变方式完全转变为奥氏体；当冷却至室温时，是以R相、马氏体相以及少量的奥氏体相存在。其加热过程中的相劐顶序为：马氏体相→R相→奥氏体相。冷却过程中的相变顺序为：奥氏体相→R相→马氏体相。     

Deformation and failure mechanism of nano-composite coatings under nano-indentation

Two nano-composite coatings based on nc-TiC particles in an a-C:H matrix are deposited via closed-field unbalanced reactive magnetron sputtering. The compositions of the coatings are varied by changing the acetylene gas flow during the depositions. A Cr/Cr–Ti/Ti–TiC graded interlayer is introduced between substrate and coating. Electron probe micro-analyses (EPMA) show that the Ti content of the coatings varies between 31.7 and 11.5 at.%. The coatings exhibit a hardness (H) of 20.0 and 15.7 GPa, and a Young's modulus (E) of 229.4 and 136.6 GPa, respectively, as measured through nano-indentations. Cube corner indentations are performed to probe the fracture toughness of the coatings through the determination of critical indentation loads (L_r) at which radial cracks start to propagate. Transmission electron microscopy (TEM) observations and energy-filtered TEM are employed to characterize the coatings nanostructures. The variation in Ti content is accompanied by a variation in TiC particle size and volumetric fraction, as well as a change in the columnar structure of the coatings. A focus ion beam (FIB) slicing technique is employed to prepare samples from nano-indented locations of coated Silicon and stainless steel (SS) substrates. TEM inspection of the FIB sliced samples determines that the most brittle phase in the coating is the C-enriched columnar boundary, and identifies the location of failure within the interlayer. As a consequence of the different nanostructure, the coatings exhibit different elastic recovery properties and toughness.     

A comparative study of reactive direct current magnetron sputtered CrAlN and CrN coatings

Approximately 1.5 μm thick CrN and CrAlN coatings were deposited on silicon and mild steel substrates by reactive direct current (DC) magnetron sputtering. The structural and mechanical properties of the coatings were characterized using X-ray diffraction (XRD) and nanoindentation techniques, respectively. The bonding structure of the coatings was characterized by X-ray photoelectron spectroscopy (XPS). The surface morphology of the coatings was studied using scanning electron microscopy (SEM) and atomic force microscopy (AFM). The XRD data showed that the CrN and CrAlN coatings exhibited B1 NaCl structure. Nanoindentation measurements showed that as-deposited CrN and CrAlN coatings exhibited a hardness of 18 and 33 GPa, respectively. Results of the surface analysis of the as-deposited coatings using SEM and AFM showed a more compact and dense microstructure for CrAlN coatings. The thermal stability of the coatings was studied by heating the coatings in air from 400 to 900 °C. The structural changes as a result of heating were studied using micro-Raman spectroscopy. The Raman data revealed that CrN coatings got oxidized at 600 °C, whereas in the case of CrAlN coatings, no detectable oxides were formed even at 800 °C. After annealing up to 700 °C, the CrN coatings displayed a hardness of only about 7.5 GPa as compared to CrAlN coatings, which exhibited hardness as high as 22.5 GPa. The potentiodynamic polarization measurements in 3.5% NaCl solution indicated that the CrAlN coatings exhibited superior corrosion resistance as compared to CrN coatings.     

高透明低发射率ITO薄膜的制备及其光电性能研究

目的研究磁控溅射工艺对ITO薄膜光电性能的影响,为制备高性能ITO薄膜提供数据和理论支撑。方法采用磁控溅射在PET基材上制备ITO薄膜,利用扫描电镜、X射线衍射仪、分光光度计、四探针、红外发射率测仪、Hall效应测试系统等,分析工艺参数对ITO薄膜光电性能的影响。结果随着氧气流量的增加,ITO薄膜在可见光区的透过率先增加,然后变缓,薄膜方块电阻先降低后升高;随着工作气压的增加,ITO薄膜的可见光透过率增加,薄膜方块电阻先下降后上升,电阻率先变小再增大,载流子浓度先增大后减小,红外发射率先减小后增大,晶体结构逐渐由晶态转变为非晶态;随着氩氧比的降低,薄膜红外发射率先降低,然后缓慢升高;随溅射时间的增加,薄膜的厚度逐渐增大,方块电阻、红外发射率和可见光透过率迅速下降,晶体结构逐渐由非晶结构转变为晶体结构。综合对比研究发现,当氧气流量为0.6 mL/min、工作气压为0.4 Pa、氩氧比为19.8∶0.2、溅射时间为80 min时,可获得综合性能优异的ITO薄膜,其可见光透过率大于80%,在8～14μm红外波段的辐射率小于0.2。结论磁控溅射工艺参数是决定薄膜综合质量的重要因素,通过严格控制工艺参数,可获得透明性高、发射率低的ITO薄膜。     

Microstructure and Application of YBCO Superconductive Films with Low Surface Resistance

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磁控溅射制备纳米Ni-Ti薄膜工艺研究

为了得到高质量的纳米薄膜，对直流磁控溅射法制备Ni-Ti薄膜工艺进行了研究。采用单晶硅和玻璃两种基体材料，并在不同的基体温度、晶化温度、溅射功率等条件下制备薄膜。之后对薄膜进行了XRD，SEM分析。分析结果表明：薄膜成分、厚度、表面形貌、致密度与溅射功率、基体温度、晶化温度、基体材料密切相关。并根据实验结果给出优化的纳米Ni-Ti薄膜制备工艺。     

掺杂Ti对Fe－N薄膜结构与磁性的影响

用对向靶溅射仪制备出含多量Ｆｅ（１６）Ｎ２相的（Ｆｅ，Ｔｉ）－Ｎ薄膜，研究了掺杂Ｔｉ对Ｆｅ－Ｎ薄膜结构与磁性的影响，在溅射Ｆｅ－Ｎ薄膜时加入适量的Ｔｉ可提高Ｆｅ－Ｎ薄膜中Ｆｅ（１６）Ｎ２相的含量．Ｔｉ含量（原子分数）在０—２５％时薄膜饱和磁化强度均高于纯Ｆｅ的值；Ｔｉ浓度为１０％时，薄膜磁化强度高达２．６８Ｔ，比纯Ｆｅ的饱和磁化强度值高２０％．     

反应溅射非晶态氧化铝薄膜SCIEI

研究了平面磁控直流反应溅射法沉积氧化铝薄膜的过程。结果表明氧分压大小对反应溅射过程有决定性作用,当氧分压增大或减小过程中存在两个阈值。氧分压小于阈值为金属Al溅射区,大于阈值为氧化铝溅射区。在阈值附近总气压、溅射电压和沉积速率发生突变,溅射特性(V-J)曲线有不同规律。沉积的氧化铝膜为非晶态,高温下可晶化,本文还讨论了反应溅射的机理。     

碳钢基体磁控溅射SiC薄膜结合力研究

采用磁控溅射法在T10钢表面获得了SiC薄膜,并研究了溅射方式、工艺参数以及中间层对薄膜结合性能的影响.试验结果表明,采用功率为200 W射频法和时间为2 h的SiC/Ni-P双层薄膜结合力最好.     

低密度超细银包铝复合软导线的制备工艺研究

采用磁控溅射真空镀膜技术制备银包铝复合线坯,通过后续不退火多道次拉拔,制备低密度的超细银包铝复合软导线。结果表明,磁控溅射处理时,银镀层厚度随走线速度加快而变薄,随溅射电流增加而增厚;拉拔加工要求银镀膜层厚度大于1.3μm,道次变形量宜小于7%;随银镀层厚度增加,制备的10μm超细丝的密度和抗拉强度均增大。将φ15μm的纯铝芯材采用优选条件溅射镀银膜,经拉拔加工制得φ10μm的银包铝复合软导线,其密度为4.87 g/cm~3,抗拉强度286 MPa,复层表面均匀致密无缺陷。