一种用于流水线结构ADC中改进速度/功耗比的CMOS动态比较器

提出了一种适用于高速、单级低分辨率流水线结构ADC的全差分动态比较器.由于采用了电流源耦合和差分对输入结构,比较器的翻转阈值电压可以设计为任意值.与传统的比较器相比,该比较器较好地兼顾了面积、功耗以及速度等方面,在这些方面有了较大的改进.该比较器在0.35μm CMOS工艺下完成流片,面积为30μm×70μm.仿真和测试结果表明,该比较器可以在2Vpp的输入信号和1GHz的时钟频率下工作,在3.3V的电源电压下,功耗仅为181μW.速度/功耗比达到了5524GS/J.     

一种用于流水线结构ADC中改进速度/功耗比的CMOS动态比较器

提出了一种适用于高速、单级低分辨率流水线结构ADC的全差分动态比较器.由于采用了电流源耦合和差分对输入结构,比较器的翻转阈值电压可以设计为任意值.与传统的比较器相比,该比较器较好地兼顾了面积、功耗以及速度等方面,在这些方面有了较大的改进.该比较器在0.35μm CMOS工艺下完成流片,面积为30μm×70μm.仿真和测试结果表明,该比较器可以在2Vpp的输入信号和1GHz的时钟频率下工作,在3.3V的电源电压下,功耗仅为181μW.速度/功耗比达到了5524GS/J.     

高速低功耗钟控比较器的设计

在分析各种比较器的基础上,设计了一种高速低功耗的钟控比较器,着重优化了比较器的速度和功耗.在SMIC 0.35μm n阱CMOS工艺条件下,采用Cadence Spectre对电路进行了模拟.结果表明,比较器的最高工作频率为200 MHz,精度为0.3 mV,在3.3 V的电源电压下,功耗仅为0.4 mW.     

低功耗高精度的电压比较器设计

设计了一款用于实现10位精度逐次逼近型模数转换器(SAR ADC)的电压比较器,该比较器采用高速高精度比较器结构并进行了优化,在高速度、低功耗锁存器的基础上加预放大级以提高比较精度,加RS触发器优化处理比较器的输出信号。同时,采用失调校准技术消除失调,预放大级采用共源共栅结构抑制回程噪声,最终获得了高精度和较低的功耗。仿真结果表明:在Chartered 0.35μm 2P4MCMOS工艺下,时钟频率5 MHz,电源电压3.3 V,分辨率达0.1 mV,平均功耗约为0.45 mW,芯片测试结果表明比较器满足了SAR ADC的要求。     

一种用于数字功放的低功耗宽输入电压比较器

设计了一种适用于数字功率放大器应用的全差分低功耗宽输入CMOS电压比较器.采用TSMC 0.18μm/3.3V CMOS工艺模型,用Cadence软件进行模拟仿真,比较器低频增益81.2dB,输入共模电压范围1.4~3.3V,整个电路的静态功耗仅248.6μW.运用该结构的比较器具有较低的失调电压,大幅度提高了比较器的精度;较宽的输入共模电压范围及低功耗,可用于数字功放等高性能模拟IP模块的设计.     

超小型SOT23-8封装的全新双路微功耗比较器

MAX90 75 / MAX90 77微功耗比较器仅需 3μA即可获得 5 40 ns的传输延迟。它工作于单电源 + 2 .1V至 + 5 .5 V,采用超小型封装 ,比业界其它任何微功耗比较器具有更优的速度 /功耗比 ,这对于各种便携式应用是非常理想的。这两款比较器还可提供满幅输出和地电平检测输入。单比较器 MAX90 75采用超小型的 SC70 - 5封装 (尺寸约占SOT2 3- 5的一半 ) ,双比较器 MAX90 77为节省空间的SOT2 3- 8封装超小型SOT23-8封装的全新双路微功耗比较器…     

基于开关运放的低功耗逐次逼近ADC设计

基于UMC 0.18 混合信号工艺,设计了一种低功耗逐次逼近ADC,重点考虑了功耗的优化和电路的改进,采用了开关运放技术,降低了传统缓冲器30%左右的能量消耗,同时比较器低功耗的设计也使该ADC节能的优点更加突出,同时比较器采用了失调校准技术,这样就能够满足10 bit精度的要求.在电源电压1.8 V、采样频率100 kHz的条件下,仿真得到该逐次逼近ADC信噪比为61.66 dB,而静态功耗仅为26μW.该设计的芯片版图面积为1 mm×1mm.     

新型高速低功耗动态比较器

基于预放大锁存理论,提出了一种新型高速低功耗动态比较器.该比较器采用预放大级、动态锁存器及输出缓冲级构成的三级结构,与传统比较器不同,该比较器采用了一种新型动态结构作为输出缓冲级以实现高速低功耗.在CSMC 0.5 μm/5 V Si CMOS工艺模型下,采用Hspice对电路进行模拟.结果表明在100 MHz的时钟下,精度可达0.2 mV,功耗仅为1.12 mw.     

一种高速高精度动态比较器

提出了一种应用于逐次逼近模数转换器的高速高精度比较器。该比较器由2级预放大器、1级锁存比较器以及缓冲电路构成。在前置预放大器中采用共源共栅结构、复位和箝位技术,提高了比较器的精度和速度,降低了功耗。在锁存比较器中引入额外的正反馈路径,提高了响应速度,降低了功耗。将锁存比较器输入对管与锁存结构隔离,降低了踢回噪声的影响,提高了比较器的精度。比较器基于SMIC 0.18 μm CMOS工艺进行设计与仿真。仿真结果表明,在1.8 V电源电压、800 MHz时钟下,比较器的精度为50 μV,传输延迟为458 ps,功耗为432 μW,芯片面积仅为0.009 mm²。     

基于0.18μm SiGe BiCMOS工艺的高速比较器分析与设计

基于预放大正反馈锁存比较理论,给出了一种8bit 8Gs/s高速比较器的设计.该比较器采用预放大器结构以提高分辨率、加快比较过程,采用主从锁存器降低亚稳态发生概率,采用输出缓冲器改善输出波形、提供测试接口;在HHNEC 0.18μm SiGe BiCMOS工艺下,采用Cadence Spectre进行仿真,结果显示,该比较器精度为4mV,输出摆幅±300mV,锁存时间37ps,过驱动恢复时间22ps,功耗约57mW,表现出良好的性能.     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.     

An improved parallel thinning algorithm with two subiterations

The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.