一种基于CMOS工艺的新型结构ESD保护电路

根据伞芯片静电放电(ESD)损伤防护理论,设计了一种新犁结构保护电路,采用0.6μm标准CMOS p阱工艺进行了新型保护电路的多项目晶圆(MPW)投片验证.通过对同一MPW中的新型结构ESD保护电路和具有同样宽长比的传统栅极接地MOS(GG-nMOS)保护电路的传输线脉冲测试,结果表明在不增加额外工艺步骤的前提下,本文设计的新型结构ESD保护电路芯片面积减少了约22%,静态电流更低,而抗ESD电压提高了近32%.该保护电路通过了5kV的人体模型测试.     

一种CMOS新型ESD保护电路设计

金属氧化物半导体(MOS)器件的缩放技术使集成电路芯片面临着严重的静电放电(ESD)威胁,而目前采用的ESD保护电路由于电流集边效应等原因,普遍存在着抗静电能力有限、占用较大芯片面积等问题。根据全芯片ESD防护机理,基于SMIC 0.18μm工艺设计并实现了一种新型ESD保护电路,其具有结构简单、占用芯片面积小、抗ESD能力强等特点。对电路的测试结果表明,相对于相同尺寸栅极接地结构ESD保护电路,新型ESD保护电路在降低35%芯片面积的同时,抗ESD击穿电压提升了32%,能够有效保护芯片内部电路免受ESD造成的损伤和降低ESD保护电路的成本。     

基于CMOS多功能数字芯片的ESD保护电路设计

基于CSMC 2P2M 0.6 μm CMOS工艺设计了一种ESD保护电路。整体电路采用Hspice和CSMC 2P2M 的0.6 μm CMOS工艺的工艺库(06mixddct02v24)仿真,基于CSMC 2P2M 0.6 μm CMOS工艺完成版图设计,并在一款多功能数字芯片上使用,版图面积为1 mm×1 mm,参与MPW(多项目晶圆)计划流片,流片测试结果表明,芯片满足设计目标。     

双界面智能卡芯片模拟前端ESD设计

双界面智能卡芯片静电放电(ESD)可靠性的关键是模拟前端(AFE)模块的ESD可靠性设计,如果按照代工厂发布的ESD设计规则设计,AFE模块的版图面积将非常大.针对双界面智能卡芯片AFE电路结构特点和失效机理,设计了一系列ESD测试结构.通过对这些结构的流片和测试分析,研究了器件设计参数和电路设计结构对双界面智能卡芯片ESD性能的影响.定制了适用于双界面智能卡芯片AFE模块设计的ESD设计规则,实现对ESD器件和AFE内核电路敏感结构的面积优化,最终成功缩小了AFE版图面积,降低了芯片加工成本,并且芯片通过了8 000 V人体模型(HBM) ESD测试.     

用于双极电路ESD保护的SCR结构设计失效分析

针对目前双极电路的ESD保护需求,引入SCR结构对芯片进行双极电路ESD保护。通过一次流片测试,发现加入SCR结构的电路芯片失效,SCR结构的I-V特性曲线未达到要求。从设计问题和工艺偏差两方面入手,分析了失效原因,通过模拟仿真,验证了失效是因为在版图设计时为节省版图面积,将结构P阱中NEMIT扩散区域边上用来箝位的电极开孔去掉造成的,并非工艺偏差导致的。通过二次流片测试,验证了失效原因分析的正确性,SCR器件结构抗ESD电压大于6kV,很好地满足了设计要求。     

基于130 nm SOI工艺数字ASIC ESD防护设计

绝缘体上硅(SOI)工艺具有寄生电容小、速度快和抗闩锁等优点,成为低功耗和高性能集成电路(IC)的首选.但SOI工艺IC更易受自加热效应(SHE)的影响,因此静电放电(ESD)防护设计成为一大技术难点.设计了一款基于130 nm部分耗尽型SOI (PD-SOI)工艺的数字专用IC (ASIC).针对SOI工艺ESD防护设计难点,进行了全芯片ESD防护原理分析,通过对ESD防护器件、I/O管脚ESD防护电路、电源钳位电路和ESD防护网络的优化设计,有效减小了SHE的影响.该电路通过了4.5 kV人体模型ESD测试,相比国内外同类电路有较大提高,可以为深亚微米SOI工艺IC ESD防护设计提供参考.     

深亚微米混合信号全芯片ESD电路设计

随着CMOS工艺的发展,集成电路元件的尺寸持续减小,芯片的静电放电(ESD)保护设计受到了更大的挑战.从系统的角度出发,采用电压域分别保护后通过隔离器件连接的方法完成了对深亚微米芯片ESD保护系统的设计.设计中分析了传统输出端保护可能存在的问题,并采用稳妥的方法对输出端进行了保护.这种架构提高了整个芯片的抗ESD能力,节省了芯片面积,达到了对整个芯片提供全方位ESD保护的目的.设计采用TSMC 0.18 μm工艺,测试结果验证了该设计的有效性.     

基于SOI工艺集成电路ESD保护网络分析与设计

由于SOI(Silicon-On-Insulator)工艺采用氧化物进行全介质隔离,而氧化物是热的不良导体,因此SOI ESD器件的散热问题使得SOI电路的ESD保护与设计遇到了新的挑战。阐述了一款基于部分耗尽SOI(PD SOI)工艺的数字信号处理电路(DSP)的ESD设计理念和方法,并且通过ESD测试、TLP分析等方法对其ESD保护网络进行分析,找出ESD网络设计的薄弱环节。通过对ESD器件与保护网络的设计优化,并经流片及实验验证,较大幅度地提高了电路的ESD保护性能。     

一种应用于深亚微米CMOS工艺的ESD保护电路

本文研究了一种基于动态栅极悬浮技术的ESD保护电路,并根据全芯片ESD防护的要求设计了试验电路。采用TSMC 0.18μm CMOS工艺实现了试验电路,测试显示芯片的ESD失效电压达到了7kV。     

基于CMOS工艺的IC卡芯片ESD保护电路

介绍了ESD保护结构的基本原理,并提出一个基于CMOS工艺用于IC卡芯片的保护电路.讨论了一些重要的设计参数对ESD保护电路性能的影响并进行了物理上的解释.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.     

An improved parallel thinning algorithm with two subiterations

The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.     

Theoretical analysis of the relationship between the Brillouin gain coefficient and the strain in the optical-fiber sensors

The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.     

Novel fiber-optical interferometer with miniaturized probe for in-hole measurements

Today, micro-system technology and the development of new MEMS （Micro-Electro-Mechanical Systems） are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.     

Study of waveguide coupling efficiency in hybrid silicon lasers

This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel＇s.     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

A rigorous proof of MIMO channel capacity’s increase with antenna number

It is well known that adding more antennas at the transmitter or at the receiver may offer larger channel capacity in the multiple-input multiple-output（MIMO） communication systems. In this letter, a simple proof is presented for the fact that the channel capacity increases with an increase in the number of receiving antennas. The proof is based on the famous capacity formula of Foschini and Gans with matrix theory.