W波段InGaAs/InP动态二分频器

采用fT=214 GHz,fmax=193 GHz的InGaAs/InP异质结双极型晶体管工艺,设计了一款基于时钟驱动型反相器的动态二分频器.该分频器工作频段为60 ～ 100 GHz,但由于测试系统上限频率的限制,只能测出62 ～ 83 GHz的工作范围.在-4.2V和-5.2 V的单电源直流偏置下该分频器的功耗分别为596.4 mW、1060.8 mW.此分频器的成功制作对于工作在W波段锁相环的构建有较大的意义.     

基于90nm CMOS工艺的12GHz二分频器

采用90 nm CMOS工艺,实现了一个基于电流模式逻辑的12 GHz二分频器.该分频器具有很宽的锁定频率范围(1～12 GHz),在输入信号频率为8 GHz时,输入灵敏度达到-30 dBm.分频器工作在1.2 V电源电压下,消耗的电流大约为1.5 mA.给出了该设计的后仿真结果.     

一种可编程的2.4GHz CMOS多模分频器

采用0.35μm CMOS工艺设计并实现了一种多模分频器.该多模分频器由一个除4或5的预分频器和一个除128～255多模分频器在同一芯片上连接而成;在电路设计中,分析了预分频器功耗和速度之间的折中关系,根据每级单元电路的输入频率不同对128～255多模分频器采用了功耗优化技术;对整个芯片的输入输出PAD进行了ESD保护设计;该分频器在单端信号输入情况下可以工作到2.4GHz,在差分信号输入下可以工作到2.6GHz以上;在3.3V电源电压下,双模预分频器的工作电流为11mA,多模分频器的工作电流为17mA;不包括PAD的芯片核心区域面积为0.65mm×0.3mm.该可编程多模分频器可以用于2.4GHz ISM频段锁相环式频率综合器.     

一种可编程的2.4GHz CMOS多模分频器

采用0.35μm CMOS工艺设计并实现了一种多模分频器.该多模分频器由一个除4或5的预分频器和一个除128～255多模分频器在同一芯片上连接而成;在电路设计中,分析了预分频器功耗和速度之间的折中关系,根据每级单元电路的输入频率不同对128～255多模分频器采用了功耗优化技术;对整个芯片的输入输出PAD进行了ESD保护设计;该分频器在单端信号输入情况下可以工作到2.4GHz,在差分信号输入下可以工作到2.6GHz以上;在3.3V电源电压下,双模预分频器的工作电流为11mA,多模分频器的工作电流为17mA;不包括PAD的芯片核心区域面积为0.65mm×0.3mm.该可编程多模分频器可以用于2.4GHz ISM频段锁相环式频率综合器.     

高速低功耗自适应可编程分频器

在约翰逊计数分频器的基础上,设计了一款双级结构分频器,采用系数自适应分配技术,显著提升了分频器的工作频率,并有效降低功耗。基于45nm CMOS工艺进行仿真,结果表明:该分频器最高工作频率可达8GHz,在1GHz时,49分频的双级可编程分频器功耗仅为63μW,在8GHz时,功耗为312μW。与典型的约翰逊结构相比,双级分频器工作频率可提升1.6倍,在分频器系数设置为6时,最大功耗优化比达到51.82%。     

微波宽带单片集成电路二分频器的设计与实现

采用D触发器进行分频,设计了基于主从D触发器的1:2分频器,该分频器主要由输入缓冲电路、分频器内核、输出缓冲电路和电流偏置电源四个模块组成.HBT工艺具有速度快、相位噪声低的优点,采用HBT工艺,成功地设计了输入频率范围为50 MHz～7 GHz的静态二分频器.测试结果表明,该分频器在输入频率为3.7 GHz,输入-20 dBm功率时,输出功率4 dBm;电源电压5 V,工作电流85 mA,芯片尺寸为0.85 mm×0.85 mm.     

一种新型小数/整数分频器

提出了一种新型小数/整数分频器电路结构,详细分析了该小数/整数分频器的工作原理.该分频器与传统分频器相比,具有控制简单、电路复杂度低、工作频率高等特点.设计基于TSMC 0.25 μm 2.5 V 1P5M CMOS工艺,最高工作频率为4.5 GHz,功耗为10.37 mA,并可以实现128到264之间小数、整数分频.后仿真结果表明,该分频器对频率合成器相位噪声特性有很好的改善作用.     

5 GHz 0.18-μm CMOS 可编程分频器

提出了一种2.4GHz ZigBee 应用的可编程分频器,其分频模值在2403-2480之间变化。该分频器基于双模分频器和吞咽计数器架构,功耗和面积得到了有效降低。芯片采用0.18-μm CMOS混合信号工艺实现,当输入信号达到7.5dBm时,分频器可正常工作的频率范围覆盖1-7.4 GHz,在100KHz频偏处的输出相位噪声为-125.3dBc/Hz。分频器核心电路消耗电流4.3mA（1.8V电源电压）,核心面积0.015mm2。测试结果表明该可编程分频器能很好的应用在所需的频率综合器中.     

基于0.5μm InP DHBT工艺的100GHz+静态及动态分频器

<正>针对超高速数模混合电路方面的应用,南京电子器件研究所开发了76.2 mm(3英寸)0.5μm InP DHBT工艺,器件截止频率达到500 GHz以上,可实现3层布线,工艺剖面图及器件性能如图1所示。采用该工艺研制出114 GHz静态分频器以及170 GHz动态分频器。图2为静态分频器及动态分频器实测结果。     

10～37 GHz CMOS四分频器的设计

给出基于0.13μm CMOS工艺、采用单时钟动态负载锁存器设计的四分频器.该四分频器由两级二分频器级联而成,级间采用缓冲电路实现隔离和电平匹配.后仿真结果表明其最高工作频率达37 GHz,分频范围为27 GHz.当电源电压为1.2 V、工作频率为37 GHz时,其功耗小于30 mW,芯片面积为0.33×0.28 mm2.     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.