共查询到18条相似文献,搜索用时 203 毫秒
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针对具有低压触发特性的静电放电(electrostatic discharge,ESD)保护电路易闩锁的不足,本文结合CSMC0.6μm CMOS工艺,设计了一种可应用于ESD保护电路中的独立双阱隔离布局方案,这种方案不仅可以有效的阻断形成闩锁的CMOS器件固有纵向PNP与横向NPN晶体管的耦合,且兼容原有工艺而不增加版图面积。将此布局方案与常规保护环结构同时应用于笔者研制的具有低压快速触发特性双通路ESD保护电路中,通过流片及测试对比表明,该布局方案在不影响保护电路特性的同时,较常规保护环结构更为有效的克服了保护电路的闩锁效应,从而进一步提升了该保护电路的鲁棒性指标。本文的布局方案为次亚微米MOS ESD保护电路版图设计提供了一种新的参考依据。 相似文献
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为了研究多晶硅发射极双极晶体管的辐射可靠性,对多晶硅发射极NPN管进行了不同偏置条件下60Co γ射线的高剂量率辐照试验和室温退火试验。试验结果表明,辐射后,基极电流IB显著增大,而集电极电流IC变化不大;反偏偏置条件下,IB的辐射损伤效应在辐射后更严重;室温退火后,IB有一定程度的持续损伤。多晶硅发射极NPN管与单晶硅发射极NPN管的辐射对比试验结果表明,多晶硅发射极NPN管的抗辐射性能较好。从器件结构和工艺条件方面,分析了多晶硅发射极NPN管的辐射损伤机理。分析了多晶硅发射极NPN管与单晶硅发射极NPN管的辐射损伤区别。 相似文献
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对高压13CD--MOS器件的结构和工艺进行了研究,用器件模拟MEDICI和工艺模拟T-SUPREM软件分别对器件结构和工艺参数进行了设计优化.在工艺兼容的前提下,设计制作了包含NPN、PNP、NMOS、PMOS、高压LDMOS等结构的BCDMOS集成电路样管.测试结果表明,样管性能与模拟结果相符. 相似文献
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设计并流片验证了一种0.18μmRFCMOS工艺的2.4GHz低噪声放大器的全芯片静电放电(ESD)保护方案。对于射频(RF)I/O口的ESD防护,主要对比了二极管、可控硅(SCR)以及不同版图的互补型SCR,经流片与测试,发现岛屿状互补型SCR对I/O端口具有很好的ESD防护综合性能。对于电源口的ESD防护,主要研究了不同触发方式的ESD保护结构,结果表明,RCMOS触发SCR结构(RCMOS-SCR)具有良好的ESD鲁棒性和开启速度。基于上述结构的全芯片ESD保护设计,RF I/O口采用岛屿状布局的互补SCR结构的ESD防护设计,该ESD防护电路引入0.16dB的噪声系数和176fF的寄生电容,在人体模型(HBM)下防护能力可达6kV;电源口采用了RCMOS-SCR,实现了5kV HBM的ESD保护能力,该设计方案已经在有关企业得到应用。 相似文献
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Shiao-Shien Chen Tung-Yang Chen Tien-Hao Tang Jin-Lian Su Tzer-Min Shen Jen-Kon Chen 《Electron Devices, IEEE Transactions on》2003,50(7):1683-1689
This paper proposes a novel low-leakage BiCMOS deep-trench (DT) diode in a 0.18-/spl mu/m silicon germanium (SiGe) BiCMOS process. By means of the DT and an n/sup +/ buried layer in the SiGe BiCMOS process, a parasitic vertical p-n-p bipolar transistor with an open-base configuration is formed in the BiCMOS DT diode. Based on the two-dimensional (2-D) simulation and measured results, the BiCMOS DT diode indeed has the lowest substrate leakage current as compared to the conventional p/sup +//n-well diode even at high temperature conditions, which mainly results from the existence of the parasitic open-base bipolar transistor. Considering the applications of the diode string in electrostatic discharge (ESD) protection circuit designs, the BiCMOS DT diode string also provides a good ESD performance. Owing to the characteristics of the low leakage current and high ESD robustness, it is very convenient for circuit designers to use the BiCMOS DT diode string in their IC designs. 相似文献
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V. A. Vashchenko A. Concannon M. ter Beek P. Hopper 《Microelectronics Reliability》2003,43(3):427-437
A 2D simulation approach that takes into account the 3D effects of electro-thermal instability during electrostatic discharge (ESD) operation, is presented. The method is used to provide physical evaluation of a safe operation regime for BiCMOS ESD protection structures and circuits. The methodology is demonstrated through the application to Si–Ge NPN bipolar transistors, snapback NMOS and LVTSCR structures. 相似文献
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Effective ESD protection circuit design has become challenging due to rapid advances in process technology. This study was launched to address those concerns in deep sub-micron technologies and to look for a process windows that preserve CDM ESD robustness for a given ESD protection designs. Experimental results for 0.18 μm integrated CPU’s together with process window effects on CDM robustness are presented and discussed. The correlation between electrical characteristics and some of the common failure modes are described. It is shown that transistor off current lower than critical value can lead to degradation in time and an eventual secondary breakdown in a parasitic NPN transistor that results in unexpected CDM sensitivity. 相似文献
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BiCMOS technologies have been used to implement the radio-frequency (RF) integrated circuits (ICs) due to the advantages of low noise, low power consumption, high drive, and high speed. The electrostatic discharge (ESD) is one of the important reliability issues of IC. When the ESD events happen, the ESD protection devices must be turned on immediately to protect the ICs, including the RF ICs in BiCMOS technologies. In this work, the vertical NPN (VNPN) devices in 0.18 μm silicon-germanium (SiGe) BiCMOS technology with base-emitter shorted and resistor trigger approaches are investigated. In component-level, using transmission-line-pulsing (TLP) and ESD simulator test the IV characteristics and human-body-model (HBM) robustness of the VNPN devices, respectively. In system-level, using ESD gun tests the system-level ESD robustness. The ESD protection of VNPN devices are further applied to a 2.4 GHz low-noise amplifier (LNA). After attaching the VNPN devices to LNA, the RF characteristics are not degraded while the ESD robustness can be much improved. 相似文献
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Shiao-Shien Chen Tung-Yang Chen Tien-Hao Tang Shao-Chang Huang Hsu T.-L. Hua-Chou Tseng Jen-Kon Chen Chiu-Hsiang Chou 《Electron Device Letters, IEEE》2003,24(3):168-170
This paper investigates the electrostatic discharge (ESD) characteristics of the silicon-germanium heterojunction bipolar transistor (SiGe HBT) in a 0.18-/spl mu/m SiGe BiCMOS process. According to this letter, the open base configuration in the SiGe HBT has lower trigger voltage and higher ESD robustness than a common base configuration. As compared to the gate-grounded NMOS and PMOS in a bulk CMOS process, the SiGe HBT has a higher ESD efficiency from the layout area point of view. Additionally, any trigger biases used to improve the ESD robustness of the SiGe HBT are observed as invalid, and even they can work successfully in bulk CMOS process. 相似文献
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Soejima K. Shida A. Koga H. Ukai J. Sata H. Hirata M. 《Solid-State Circuits, IEEE Journal of》1990,25(2):410-416
A fully complementary BiCMOS technology based on a 2-μm process designed for 12-V analog/digital applications is described. In this technology, a triple diffused vertical p-n-p transistor and n-p-n bipolar and CMOS devices are integrated in a single chip. A transition frequency of 660 MHz and a collector-to-emitter breakdown voltage of over 15 V have been obtained for the collector-isolated p-n-p transistor by adding only one extra mask to a conventional 2-μm BiCMOS process. The total number of masks is 20 with double-layer metallization. A unity gain frequency of 52 MHz and a DC gain of 85 dB have been obtained for a single-supply operational amplifier with a vertical p-n-p first stage. The propagation delay time for a CMOS two-NAND gate was 1.27 ns driving three loads and 3 mm of metal 相似文献
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设计了一种新颖的伪垂直结构PNP晶体管。在锗硅BiCMOS工艺基础上,仅增加基区和集电区两道离子注入,以低成本工艺实现了优良的性能。晶体管电流增益在30以上,击穿电压大于7V,特征频率10GHz,满足高速电路设计的要求。 相似文献
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利用双极型管电流增益的温度特性,采用UMC0.6μm BiCMOS工艺设计了一款指数型温度补偿BiCMOS带隙基准电压源。测试结果表明:温度在10°C~100°C之间变化,带隙基准电压随温度变化最大偏移为2.5mV;电源电压在2.5~5.0V之间变化,带隙基准电压随电源电压直流变化最大偏移为0.95mV。该带隙基准电压具有较高的温度稳定性和电压稳定性。 相似文献