一种1.8V24×10-6/℃宽温度范围CMOS带隙基准电压源

阐述了一种输出电压为853 hV的带隙基准电压源电路,该电路采用0.18μm标准CMOS工艺实现,可在1.8 V的电源电压下工作,在-20℃到120℃温度范围内其温度系数为24×10-6/℃.在频率低于10kHz时,电源抑制比保持在-66dB.电路版图的有效面积为0.022 mm2.该电路已成功应用于低功耗CMOS图象传感器芯片当中.     

一种改进型低温度系数带隙基准源电路

在传统带隙基准源的基础上,设计了一种改进型带隙基准源电路,能很好地抑制三极管集电极电流变化对输出的影响,获得很低的温度系数和很高的电源电压抑制比。基于BCD 0.18 μm工艺库,仿真结果表明,当电源电压VIN为4.5 V,温度范围为-40 ℃~140 ℃时,基准源电路的输出电压范围为1.2567~1.2581 V,温度系数为6.3 ×10-6/℃;电源电压在2.5~5 V范围内变化时,基准源电路输出的最大变化仅为1.66×10-4 V,线性调整率为0.006 64 %;低频电源电压抑制比高达97 dB。过温保护电路(OTP)仿真表明,该基准源电路有良好的温度特性,温度不高于140 ℃都可正常工作。     

一种宽电源电压的高精度带隙基准电路的设计

设计了一种宽电源电压的高精度带隙基准电路.在综合考虑精度、电源抑制比(PSRR)、宽电源电压要求和功耗等因素的基础上,采用了一种由基准电压偏置的,增益和电源抑制比大小相近的运算放大器解决方案.设计采用CSMC 0.5μm CMOS工艺,电源为3.3V. Cadence Spectre 仿真表明,当温度在 -40 ℃～125 ℃,电源电压在2.56V～8V时,输出基准电压平均值为1.290V,变化0.793mV,有效温度系数为3.72ppm/ ℃;室温下,在低频时具有-97dB的PSRR,在100kHz时为-69dB,功耗为180μW.     

一种高精度BiCMOS电流模带隙基准源

采用Xfab0.35μmBiCMOS工艺设计了一种高电源抑制比（PSRR）、低温漂、输出0.5V的带隙基准源电路。该设计中,电路采用新型电流模带隙基准,解决了传统电流模带隙基准的第三简并态的问题,且实现了较低的基准电压;增加了修调电路,实现了基准电压的微调。利用Cadence软件对其进行仿真验证,其结果显示,当温度在-40～＋120℃范围内变化时,输出基准电压的温度系数为15ppm/℃;电源电压在2～4V范围内变化时,基准电压摆动小于0.06mV;低频下具有-102.6dB的PSRR,40kHz前电源抑制比仍小于-100dB。     

一种低温度系数带隙基准电压源

描述了一个具有高电源抑制比和低温度系数的带隙基准电压源电路。基于1阶零温度系数点可调节的结构,通过对不同零温度系数点带隙电压的转换实现低温度系数,并采用了电源波动抑制电路。采用SMIC 0.18μm CMOS工艺,经过Cadence Spectre仿真验证,在-20℃～100℃温度范围内,电压变化范围小于0.5mV,温度系数不超过7×10-6/℃。低频下的电源抑制比为-107dB,在10kHz下,电源抑制比可达到-90dB。整个电路在供电电压大于2.3V时可以实现正常启动,在3.3V电源供电下,电路的功耗约为1.05mW。     

一种新型CMOS带隙基准电压源

传统带隙基准源电路采用PNP型三极管来产生ΔVbe,此结构使运放输入失调电压直接影响输出电压的精度。文章在对传统CMOS带隙电压基准源电路原理的分析基础上,提出了一种综合了一阶温度补偿和双极型带隙基准电路结构优点的高性能带隙基准电压源。采用NPN型三极管产生ΔVbe,消除了运放失调电压影响。该电路结构简洁,电源抑制比高。整个电路采用SMIC 0.18μmCMOS工艺实现。通过Cadence模拟软件进行仿真,带隙基准的输出电压为1.24V,在-40℃~120℃温度范围内其温度系数为30×10-6/℃,电源抑制比(PSRR)为-88 dB,电压拉偏特性为31.2×10-6/V。     

一种新型温度补偿方式的带隙基准电压源

设计产生正、负温度系数电压的电路,在传统基准电压源电路的基础上引入新型具有负温度系数电压的补偿电路,使基准的温度系数大大降低。设计基于中芯国际SMIC 0.18μm工艺,仿真结果表明:在工作电压5 V及环境温度27℃下,输出电压为1.3 V;在0～145℃温度变化范围内,温度系数为4.46×10-6/℃。采用二级运放结构,在低频时电源电压抑制比(PSRR)为-73.66 d B;完成了版图设计,版图尺寸为81.44μm×129.47μm。     

一种高精度低温漂带隙基准源设计

基于TSMC40nmCMOS工艺设计了一种高精度带隙基准电路。采用Spectre工具仿真,结果表明,带隙基准输出电压在温度为-40—125℃的范围内具有10×10^-6／℃的温度系数,在电源电压在1．5-5．5V变化时,基准输出电压随电源电压变化仅为0．42mV,变化率为0．23mv／V,采用共源共栅电流镜后,带隙基准在低频下的电源电压抑制比为-72dB。     

一种适用于单片集成DC-DC变换器的带隙基准电路

文章设计了一种用于单片集成DC-DC变换器的高性能带隙基准电压电路。当温度从-40℃～125℃变化时,温度系数为23ppm/k,其电源抑制比(PSRR)为54dB。当输入电压在2.5V～6V变化时,基准电压的变化范围为±0.055mV。     

一种带曲率补偿的CMOS带隙基准源

设计了一种基于UMC 0.25μm BCD工艺的带隙基准电路。采用放大器钳位的传统实现方式,运用自偏置启动电路,鉴于对温漂的要求选用了二阶补偿电路。HSPICE仿真结果显示:在5.0 V供电电压下,温度在–40~+125℃变化时,基准输出1.196 2 V,波动范围为1.195 9~1.196 3 V,温度系数为3.76×10–6/℃;电源电压从2.5 V到5.0 V变化时,基准输出电压VREF的线性调整率为0.38%,低频时电路的电源抑制比(PSRR)为–83 d B。     

Technology innovation and process integrations for sub-100nm gate patterning

This paper presents a brief overview of the Applied Centura(R)DPS(R)system,configured with silicon etch DPS Ⅱ chamber, with emphasis on discussing tuning capability for CD uniformity control. It also presents the studies of etch process chemistry and film integration impact for an overall successful gate patterning development. Discussions will focus on resolutions to key issues, such as CD uniformity, line-edge roughness, and multilayer film etching integration.     

White organic light-emitting devices based on fac tris（2- phenylpyridine） iridium sensitized 5,6,11,12-tetraphenylnap -hthacene

We have fabricated the white organic light-emitting devices （WOLEDs） based on 4,4＇ -bis（2,2 -diphenyl vinyl）-1,1＇ - biphenyl （DPVBi） and phosphorescence sensitized 5,6,11,12,-tetraphenylnaphthacene （rubrene）. The device structure is ITO/2T-NATA （20 nm）/NPBX （20 nm）/CBP： x%Ir（ppy）3：0.5% rubrene （8 nm）/NPBX （5 nm）/DPVBi （30 nm）/Alq（30 nm）/LiF（0.5 nm）/A1. In the devices, DPVBi acts as a blue light-emitting layer, the rubrene is sensitized by a phosphorescent material, fac tris （2-phenylpyridine） iridium [Ir（ppy）3], acts as a yellow light-emitting layer, and N,N＇ -bis- （1-naphthyl）- N,N＇ -diphenyl -1, 1＇ -biphenyl-4,4＇ -diamine （NPBX） acts as a hole transporting and exciton blocker layer, respectively. When the concentration of Ir （PPY）3 is 6wt%, the maximum luminance is 24960 cd/m^2 at an applied voltage of 15 V, and the maximum luminous efficiency is 5.17 cd/A at an applied voltage of 8 V.     

Complete approach to automatic identification and subpixel center location for ellipse feature

To meet the need of automatic image features extraction with high precision in visual inspection, a complete approach to automatic identification and sub-pixel center location for similar-ellipse feature is proposed. In the method, the feature area is identified automatically based on the edge attribute, and the sub-pixel center location is accomplished with the leastsquare algorithm. It shows that the method is valid, practical, and has high precision by experiment. Meanwhile this method can meet the need of instrumentation of visual inspection because of easy realization and without man-machine interaction.     

小角度扩展相关性近似算法分析

本论文提出一种在多天线MIMO信道相关性建模中小角度扩展近似理论算法,并应用于分析MIMO系统性能。分析中分别对三种不同角能量分布情况下的空间相关性研发快速近似计算法,并同时提出双模(Bi-Modal)角能量分布情况下的近似运算。通过分析这些新方法的近似效率,可以得到计算简单、复杂度低、而且符合实际的MIMO相关信道矩阵,对系统级的快速高效计算法的研究和系统级的评估以及误差分析具有重要的意义。     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

A Versatile Mixed-Signal Pin Approach for Cost-Effective Test of Automotive ICs

Integrated circuits (ICs) intended for increasingly sophisticated automotive applications bring unique test demands. Advanced ICs for applications such as highly integrated automatic braking system (ABS) and airbag controllers combine high voltage digital channels, significant VI demands and precise timing capability. Along with continued missioncritical reliability concerns, the trend toward higher voltage operation and increased device integration requires specialized test capabilities able to extend across the wide operating ranges found in automotive applications. Among these capabilities, automotive test requirements increasingly dictate a need for a cost-effective versatile mixed-signal pin electronics with very high data rates reaching up to 50MHz with a voltage swing of-2 V to +28 V.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

Critical Stage Rule-Based Real Time Dispatch（RTD）System in Highly-Mixed-Products （HMP） FAB

An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.     

Optical vibration and deviation measurement of rotating machine parts

It is of interest to get appropriate information about the dynamic behaviour of rotating machinery parts in service. This paper presents an approach of optical vibration and deviation measurement of such parts. Essential of this method is an image derotator combined with a high speed camera or a laser doppler vibrometer （LDV）.