多晶发射极双台面微波功率SiGe HBT

研制成功了可商业化的75mm单片超高真空化学气相淀积锗硅外延设备SGE50 0 ,并生长了器件级SiGeHBT材料.研制了具有优良小电流特性的多晶发射极双台面微波功率SiGeHBT器件,其性能为:β=60 @VCE/IC=9V/ 30 0 μA ,β=1 0 0 @5V/ 50mA ,BVCBO=2 2V ,ft/ fmax=5 4GHz/ 7 7GHz @1 0指,3V/ 1 0mA .多晶发射极可进一步提供直流和射频性能的折衷,该工艺总共只有6步光刻,与CMOS工艺兼容且(因多晶发射极)无需发射极外延层的生长,这些优点使其适合于商业化生产.利用60指和1 2 0指的SiGeHBT制作了微波锗硅功率放大器.60指功放在90 0MHz和3 5V/ 0 2A偏置时在1dB压缩     

BVCBO为23V且fT为7GHz 30叉指微波功率SiGe HBT

在125mm标准CMOS工艺线上,对标准CMOS工艺经过一些必要的改动后,研制出了多叉指功率SiGe HBT.该器件的BVCBO为23V.在较大IC范围内,电流增益均非常稳定.在直流工作点IC=40mA ,VCE=8V测得fT为7GHz,表现出较大的电流处理能力.在B类连续波条件下,工作频率为3GHz时,测得输出功率为31dBm,Gp为10dB,且PAE为33.3%.测试结果表明,单片成品率达到了85%,意味着该研究结果已达到产业化水平.     

用于无线PA的高频大功率Si1-xGex/Si HBT的设计和制作

采用简单的双台面工艺制作了完全平面结构的2个单元4个发射极指的SiGe HBT.在没有扣除测试结构的影响下,当直流偏置IC=10mA,VCE=2.5V时,FT和fmax分别为1.8和10.1GHz.增益β为144.25,BVCBO为9V.     

Design and Fabrication of Power Si1-xGex/Si Heterojunction Bipolar Transistor for Wireless Power Amplifier Applications

采用简单的双台面工艺制作了完全平面结构的2个单元4个发射极指的SiGe HBT.在没有扣除测试结构的影响下,当直流偏置IC=10mA,VCE=2.5V时,FT和fmax分别为1.8和10.1GHz.增益β为144.25,BVCBO为9V.     

用于SiGe HBT器件的UHV/CVDn-型硅外延研究

利用超高真空化学气相淀积(UHV/CVD)设备,在掺As n+型Si衬底上生长了掺P n-型Si外延层.用扩展电阻法分析了在不同的生长温度和PH3气体流量下生长的Si外延层的过渡区厚度.结果表明,生长温度对n+-Si衬底的As外扩有明显影响,在700℃下生长的Si外延层的过渡区厚度为0.16μm,而在500℃下仅为0.06μm,且杂质分布非常陡峭.X射线双晶衍射分析表明在700℃下生长的Si外延层的质量很高.制作的锗硅异质结晶体管(SiGe HBT)的击穿特性很硬,击穿电压为14.5V,在 V CB =14.0V下的漏电流仅为0.3μA;输出特性很好,在 V CE =5V, I C=3mA时的放大倍数为60.     

一种新型双多晶自对准结构的高压功率SiGe HBT

为了改善高压功率SiGe HBT的综合性能,应用图形外延SiGe工艺,研制出了一种新型的双多晶自对准SiGe HBT器件.相对于双台面结构的SiGe HBT而言,该结构的SiGe HBT在发射极总周长不变的情况下,其发射结面积减少超过50%,集电结面积减少近70%,BVCBO也提高了近28%.经测试,器件的结漏电和直流增益等参数均符合设计要求.     

一种带功率检测的TD-SCDMA锗硅功率放大器

设计了一个用于TD-SCDMA的锗硅异质结双极晶体管(SiGe HBT)功率放大器。该放大器使用3.3 V电源,内部实现了包括级间匹配网络等的全电路片上集成。对于码分多址环境,功率放大器提供28 dBm的功率输出,实现34.8%的功率附加效率(PAE),另外,在28 dBm的输出功率下,邻道功率泄漏比(ACPR)小于-35 dBc。该功率放大器同时包括动态控制偏置电路和完全集成的功率检测器。     

一种应用于GPS接收机的高线性度SiGe HBT低噪声放大器

A high linearity 1.575 GHz SiGe：HBT low noise amplifier （LNA） for global positioning system applications is described. The bipolar cascoded with an MOSFET LNA was fabricated in a commercial 0.18 μm SiGe BiCMOS process, A resistor bias feed circuit with a feedback resistor was designed for the LNA input transistor to improve its intermodulation and compression performance. The packaged chip tested on board has displayed a noise figure of 1. I 1 dB, a power gain of 18 dB, an output 1 dB compression point of ＋7.8 dBm and an input third-order intercept point of ＋1.8 dBm. The chip occupies a 500 × 560μm^2 area and consumes 3.6 mA from a 2.85 V power supply.     

TiSi2在微波低噪声SiGe HBT中的应用

通过在SiGe HBT外基区和多晶发射极上制作TiSi2,从而使器件的高频噪声系数得到进一步降低.以PD=200mW的SiGe HBT为例,采用TiSi2工艺的噪声系数典型值为F=1.6dB@1.1GHz,明显低于无TiSi2工艺SiGe HBT的2.0dB@1.1GHz,且频率越高,二者差别越大.     

新型发射极指组合结构功率SiGe HBT热分析

提出了一种发射极指分段和非均匀发射极指长、指间距组合的新型器件结构,以改善多指功率硅锗异质结双极晶体管(SiGe HBT)的热稳定性。考虑器件具有多层热阻,发展建立了相应的热传导模型。以十指功率SiGe HBT为例,运用有限元方法对其进行热模拟,得到三维温度分布。与传统发射极结构器件相比,新结构器件最高结温从416.3 K下降到405 K,各个发射指上的高低温差从7 K～8 K下降为1.5 K～3 K,热阻值下降14.67 K/W,器件整体温度分布更加均匀。     

Monolithic SiGe HBT Feedforward Variable Gain Amplifiers for 5 GHz Applications

Monolithic SiGe heterojunction bipolar transistor (HBT) variable gain amplifiers (VGAs) with a feedforward configuration have been newly developed for 5 GHz applications. Two types of the feedforward VGAs have been made: one using a coupled‐emitter resistor and the other using an HBT‐based current source. At 5.2 GHz, both of the VGAs achieve a dynamic gain‐control range of 23 dB with a control‐voltage range from 0.4 to 2.6 V. The gain‐tuning sensitivity is 90 mV/dB. At V_CTRL= 2.4 V, the 1 dB compression output power, P_1‐dB, and dc bias current are 0 dBm and 59 mA in a VGA with an emitter resistor and ‐1.8 dBm and 71mA in a VGA with a constant current source, respectively.     

250 W HVHBT Doherty With 57% WCDMA Efficiency Linearized to ${-}$55 dBc for 2c11 6.5 dB PAR

A two-way symmetrical Doherty amplifier exhibiting 250 W saturated power has been developed using high-voltage HBT (HVHBT) GaAs technology biased at 28 V on the collector. Greater than 57% collector efficiency at 50 W (47 dBm) average output power has been demonstrated while achieving -55 dBc linearized ACPR at 5 MHz offset using a two-carrier-side-by-side WCDMA input signal with 6.5 dB PAR measured at 0.01% probability on the CCDF. In addition, a two-stage HVHBT lineup exhibiting 450 W (56.5 dBm) peak power has been demonstrated. The output stage consists of a pair of 250 W two-way symmetrical Doherty amplifiers power combined using a low-loss branchline combiner and driven by a single-ended 100 W class AB high-efficiency amplifier. The lineup demonstrated 44% PAE at 100 W (50 dBm) average output power with 25 dB lineup gain while achieving - 55 dBc linearized ACPR at 5 MHz offset using a two-carrier-side-by-side WCDMA input signal with 6.5 dB PAR measured at 0.01% probability on the CCDF. The lineup exhibits 400 W (56 dBm) PldB at 60% PAE CW, with 45% PAE at 6 dB backoff.     

应用于TD-LTE的SiGe BiCMOS功率 放大器的设计

针对准第四代无线通信技术TD-LTE中2.570~2.620 GHz频段的应用,设计了一款基于IBM SiGe BiCMOS7WL工艺的射频功率放大器。该功率放大器工作于AB类,采用单端结构,由两级共发射极电路级联构成,带有基极镇流电阻,除两个谐振电感采用片外元件外,其他全部元件均片上集成,芯片面积为(1.004×0.736)mm2。测试结果表明,在3.3 V电源电压下,电路总消耗电流为109 mA,放大器的功率增益为16 dB,输出1 dB增益压缩点为15 dBm。该驱动放大器具有良好的输入匹配,工作稳定。     

An 18-GHz 300-mW SiGe power HBT

An 18-GHz, 300-mW SiGe power heterojunction bipolar transistor (HBT) is demonstrated. The optimization of SiGe HBT vertical profile has enabled this type of devices to operate with high gain and high power at this high frequency. In the common-base configuration, a continuous wave output power of 24.73 dBm with a power gain of 4.5 dB was measured from a single 20-emitter stripe SiGe (2/spl times/30 /spl mu/m/sup 2/ of each emitter finger) double HBT. The overall performance characteristics represent the state-of-the-art SiGe power HBTs operating in the K-band frequency range.     

Algorithmic Design of CMOS LNAs and PAs for 60-GHz Radio

Sixty-gigahertz power (PA) and low-noise (LNA) amplifiers have been implemented, based on algorithmic design methodologies for mm-wave CMOS amplifiers, in a 90-nm RF-CMOS process with thick 9-metal-layer Cu backend and transistor f_T/f_MAX of 120 GHz/200 GHz. The PA, fabricated for the first time in CMOS at 60 GHz, operates from a 1.5-V supply with 5.2 dB power gain, a 3-dB bandwidth >13 GHz, a P _1dB of +6.4 dBm with 7% PAE and a saturated output power of +9.3 dBm at 60 GHz. The LNA represents the first 90-nm CMOS implementation at 60 GHz and demonstrates improvements in noise, gain and power dissipation compared to earlier 60-GHz LNAs in 160-GHz SiGe HBT and 0.13-mum CMOS technologies. It features 14.6 dB gain, an IIP ₃ of -6.8 dBm, and a noise figure lower than 5.5 dB, while drawing 16 mA from a 1.5-V supply. The use of spiral inductors for on-chip matching results in highly compact layouts, with the total PA and LNA die areas with pads measuring 0.35times0.43 mm² and 0.35times0.40 mm², respectively     

A 2.4-GHz SiGe HBT power amplifier with bias current controlling circuit

A 2.4-GHz SiGe HBT power amplifier (PA) with a novel bias current controlling circuit has been realized in IBM 0.35-μm SiGe BiCMOS technology, BiCMOS5PAe. The bias circuit switches the quiescent current to make the PA operate in a high or low power mode. Under a single supply voltage of 3.5 V, the two-stage mode-switchable power amplifier provides a PAE improvement up to 56.7% and 19.2% at an output power of 0 and 20 dBm, respectively, with a reduced quiescent current in the low power mode as compared to only operating the PA in the high power mode. The die size is only 1.32 × 1.37 mm2.     

A 21-26-GHz SiGe bipolar power amplifier MMIC

A three-stage 21-26-GHz medium-power amplifier fabricated in f/sub T/=120 GHz 0.2 /spl mu/m SiGe HBT technology has 19 dB small-signal gain and 15 dB gain at maximum output power. It delivers 23 dBm, 19.75% PAE at 22 GHz, and 21 dBm, 13% PAE at 24 GHz. The differential common-base topology extends the supply to BV/sub CEO/ of the transistors (1.8 V). New on-chip components, such as onchip interconnects with floating differential shields, and self-shielding four-way power combining/dividing baluns provide inter-stage coupling and single-ended I/O interfaces at the input and output. The 2.45/spl times/2.45 mm/sup 2/ MMIC was mounted as a flipchip and tested without a heatsink.     

应用于WCDMA的双频单片SiGe BiCMOS功率放大器

采用0.18μm SiGe BiCMOS工艺设计实现了一款用于3GPP WCDMA 850/2100(band-I/band-V)的双频单芯片功率放大器(PA)。PA采用单端共射级3级级联的结构,具有带模拟开关的片上偏置电路,通过控制偏置电流对两个PA工作状态进行切换。制造的芯片面积为1.82 mm×2.83 mm,片上集成了开关电路、偏置电路和输入匹配、级间匹配电路。在3.3 V电源电压下测试结果表明,对于band-V(CLR)频段,PA的线性输出功率P1 dB为28.6 dBm,5 dBm输入时,功率附加效率PAE,为34%。对于band-I(IMT)频段,PA的P1 dB为26.3 dBm,PAE为31%。     

基于SiGe工艺的高增益射频功率放大器

基于0.13μm SiGe HBT工艺,设计应用于无线局域网(WLAN)802.11b/g频段范围内的高增益射频功率放大器.该功放工作在AB类,由三级放大电路级联构成,并带有温度补偿和线性化的偏置电路.仿真结果显示:功率增益高达30dB,1dB压缩点输出功率为24dBm,电路的S参数S11在1.5～4GHz大的频率范围内均小于-17dB,S21大于30dB,输出匹配S22小于-10dB,S12小于-90dB.最高效率可达42.7%,1dB压缩点效率为37%.